Abstract:In this paper, we report on the design, modeling, fabrication, and characterization of an amorphous silicon microcavity. The microcavity is fabricated using a one-dimensional photonic bandgap structure. The structure was grown by plasma deposition method. Quarter wavelength thick stacks of hydrogenated amorphous silicon nitride and hydrogenated amorphous silicon oxide were consecutively deposited using low temperature plasma enhanced chemical vapor deposition. For the characterization of the dielectric microca… Show more
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