2001
DOI: 10.1117/12.453630
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<title>Self-referencing, motion-insensitive approach for absolute aspheric profiling of large optics to the nanometer level and beyond</title>

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Cited by 2 publications
(5 citation statements)
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“…has initiated a third--scale mirror fabrication effort designed primarily to develop the necessary metrology verify the figure for this long a focal length, as well as the mount performance. The metrology system, developed by Bauer Associates, has been reported on elsewhere 34,35 , and is capable of meeting the RAM requirements. The primary and secondary mirrors are also measured interferometrically using a phase-shifting point-diffraction interferometer.…”
Section: Hri Optics Fabrication and Metrologymentioning
confidence: 99%
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“…has initiated a third--scale mirror fabrication effort designed primarily to develop the necessary metrology verify the figure for this long a focal length, as well as the mount performance. The metrology system, developed by Bauer Associates, has been reported on elsewhere 34,35 , and is capable of meeting the RAM requirements. The primary and secondary mirrors are also measured interferometrically using a phase-shifting point-diffraction interferometer.…”
Section: Hri Optics Fabrication and Metrologymentioning
confidence: 99%
“…Ultra-high precision optics and metrology (TRL 6): Comparable size/quality are currently fabricated for X-ray lithography, though slightly smaller than the primary optic of the HRI (0.5m vs. 0.65m). Specialized metrology 34,35 has been developed under a technology development program to measure the surface figure and radius of curvature of the RAM HRI primary optic. These technologies have already shown 0.1nm sensitivities and 2nm repeatability without any effort at thermal control of the metrology system , 35. 5.…”
Section: Key Technologies and Statusmentioning
confidence: 99%
“…More recently, a similar system was again proposed [16] together with an alternative experimental realization. Another system was suggested [17,18] using four or more sensors located on a rotating ring scanning the artifact.…”
Section: Introductionmentioning
confidence: 99%
“…Basically, such systems can be classified according to the measurand: most common are systems with the distance [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20], the slope [21][22][23][24][25][26][27][28] or the curvature [29][30][31] as the measurand.…”
Section: Introductionmentioning
confidence: 99%
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