1994
DOI: 10.1117/12.186760
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<title>Reliability simulator for improving IC manufacturability</title>

Abstract: A Monte-Carlo reliability simulator for integrated circuits that incorporates the effects of process-flaws, material properties, the mask layout and use-conditions for interconnects is presented. The mask layout is decomposed into distinct objects, such as contiguous metal runs, vias and contacts, for which user-defined cumulative distribution functions (cdfs) are used for determining the probability of failure. These cdf's are represented using a mixture of defect-related and wearout-related distributions. Th… Show more

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