&lt;title&gt;Processing parameter optimization for thermochemical writing of DOEs on chromium films&lt;/title&gt;

Cherkashin, Vadim V.; Churin, E.G.; Korolkov, V. P.; Koronkevich, V. P.; Kharissov, Andrey A.; Полещук, А. Г.; Burge, James H.

doi:10.1117/12.274415

Cited by 24 publications

(12 citation statements)

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“…As it is clear from the aforesaid, the author's (see, e.g., [1][2][3][4][5]) and other researchers' [6][7][8][9][10] experience demonstrates that the main reason for the selectivity of chromium etching under the normal conditions is its oxidation to give the most stable oxide Cr 2 O 3 . Therefore, efforts were made to confirm the presence of this oxide presence in a study of the structure and composition of irradiated Cr films [38].…”

Section: Effect Of Short Pulse Lasers: Oxidation Plus Structural Modimentioning

confidence: 97%

“…The writing errors of the CGH structure of these two DOEs were within 50 nm, as verified by the methods described in [7]. The maximum wavefront error was under λ/15-λ/20.…”

Section: Application Of Doe For Aspheric Optics Testingmentioning

confidence: 99%

“…The CLWS was used in experiments on irradiation of the chromium films [7,25] at scanning velocities V sc of 0.044-875 cm/s, which corresponds to writing radii of 0.007-140 mm at a rotation speed of 600 rpm and irradiation time τ ranging from ∼100 ms in the central zones of DOE to ∼50 ns at its periphery. The optimum power P at the writing spot for thermochemical writing was within 10-50 mW, which is sufficient for providing a power density of about 10 6 − 10 7 W/cm 2 to heat the chromium film to its oxidation temperature.…”

Section: Direct Thermochemical Doe Writing Doe Writing Modesmentioning

confidence: 99%

“…The writing process introduces errors into the written microstructure. The main source of errors is the incorrect choice of the writing power, radiation power and writing strategy [7]. We consider the influence of the chosen writing radiation power on the angular and radial sizes (width and length) of the recorded line (track) in the thermochemical writing.…”

Section: Direct Thermochemical Doe Writing Doe Writing Modesmentioning

confidence: 99%

“…The scientists of the laboratory succeeded in finding a very high-precision tool for this purpose, laser generator of ring images, and the above thermochemical idea was granted a second birth here. Unique DOEs for astronomy [7] and other elements were designed and fabricated by this method.…”

Section: Introductionmentioning

confidence: 99%

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Laser-Induced Local Oxidation of Thin Metal Films: Physical Fundamentals and Applications

Veiko

Полещук

2014

Fundamentals of Laser-Assisted Micro- And Nanotechnologies

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Local laser oxidation of thin metal films allows recording of an optical image on thin films with the highest resolution and high productivity at the same time, and without distortions specific to laser ablation. A technique for writing of diffractive optical elements was developed on the basis of this process. Laser-matter interaction physics and laser technology underlying this method are described in this chapter. IntroductionIn our opinion, laser oxidation of thin metal films is a successful example of the discovery of a new effect, its explanation and application. Furthermore, although all these developments took place at the beginning of the laser era, the interest in these has not decayed up to now, not to mention a new technique (short-pulse laser writing), at this point, a new physics was also required due to the coming of the "nano" era.Let us briefly describe these developments in the introduction because the authors were their direct participants. The effect that formed the basis of the research field under discussion was first observed in our experiments aimed to determine the evaporation thresholds q ev of thin chromium films exposed in the optical projection

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Section: Effect Of Short Pulse Lasers: Oxidation Plus Structural Modimentioning

confidence: 97%

“…The writing errors of the CGH structure of these two DOEs were within 50 nm, as verified by the methods described in [7]. The maximum wavefront error was under λ/15-λ/20.…”

Section: Application Of Doe For Aspheric Optics Testingmentioning

confidence: 99%

Section: Direct Thermochemical Doe Writing Doe Writing Modesmentioning

confidence: 99%

Section: Direct Thermochemical Doe Writing Doe Writing Modesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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