&lt;title&gt;Preliminary results on x-ray lithography using a compact plasma focus&lt;/title&gt;

Feng, Xiaohua; Guan, Zailin; Lee, Paul; Liu, Mahe; Şerban, Adrian; Springham, S. V.; Wong, Terence Kin Shun; Wira, K.; Selvam, C.; Thang, Ai Qin

doi:10.1117/12.280532

Cited by 10 publications

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“…Fig. 8 shows SXR lithographic exposures to confirm the SXR flux of NX1 and NX2 [13]. The resist used has a sensitivity rated at 100 mJ/cm and is placed 40 cm from the focus.…”

Section: Resultsmentioning

confidence: 99%

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High rep rate high performance plasma focus as a powerful radiation source

Lee

Zhang

et al. 1998

IEEE Trans. Plasma Sci.

176

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Basic operational characteristics of the plasma focus are considered from design perspectives to develop powerful radiation sources. Using these ideas we have developed two compact plasma focus (CPF) devices operating in neon with high performance and high repetition rate capacity for use as an intense soft X-ray (SXR) source for microelectronics lithography. The NX1 is a four-module system with a peak current of 320 kA when the capacitor bank (7.8 F 2 4) is charged to 14 kV. It produces 100 J of SXR per shot (4% wall plug efficiency) giving at 3 Hz, 300 W of average SXR power into 4. The NX2 is also a four-module system. Each module uses a rail gap switching 12 capacitors each with a capacity of 0.6 F. The NX2 operates with peak currents of 400 kA at 11.5 kV into watercooled electrodes at repetition rates up to 16 Hz to produce 300 W SXR in burst durations of several minutes. SXR lithographs are taken from both machines to demonstrate that sufficient SXR flux is generated for an exposure with only 300 shots. In addition, flash electron lithographs are also obtained requiring only ten shots per exposure. Such high performance compact machines may be improved to yield over 1 kW of SXR, enabling sufficient exposure throughput to be of interest to the wafer industry. In deuterium the neutron yield could be over 10 10 neutrons per second over prolonged bursts of minutes.

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“…Fig. 8 shows SXR lithographic exposures to confirm the SXR flux of NX1 and NX2 [13]. The resist used has a sensitivity rated at 100 mJ/cm and is placed 40 cm from the focus.…”

Section: Resultsmentioning

confidence: 99%

“…The exposure was used to estimate the electron beam current as 50 A over the 5 Hz burst. The electron energy was estimated as 30 keV [13].…”

Section: Resultsmentioning

confidence: 99%

High rep rate high performance plasma focus as a powerful radiation source

Lee

Zhang

et al. 1998

IEEE Trans. Plasma Sci.

176

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“…The emitted neutrons could be applied to perform radiographs and substance analysis, taking advantage of the penetration and activation properties of neutral radiation. The intense x-ray pulses produced by bremsstrahlung radiation from localized electron beams and from hot-spots are excellent candidates for radiography of moving or wet objects and for microelectronic lithography [21][22][23].…”

Section: Introduction and General Overviewmentioning

confidence: 99%

New trends and future perspectives on plasma focus research

Soto

2005

Plasma Phys. Control. Fusion

291

211

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This paper includes a brief overview of the contributions and results of several groups working in plasma focus (PF) devices around the world in the last few years. In section 2 a summary of the most important results of the dense transient plasma research programme of the Comisión Chilena de Energía Nuclear is presented. An approach to an integrated vision of the present PF research status is presented in the next section. Some parameters that remain practically constant in PF devices that operate in a wide range of energies from 1 MJ to tens of joules are discussed. These parameters ('plasma energy density parameter' and 'drive parameter') are used as a design tool to achieve an ultra-miniature pinch focus device operating at energies less than 1 J. Preliminary results of such an ultra-miniature device are presented. Applications to non-destructive tests, detection of substances, pulsed radiation in biology and material sciences are also briefly discussed in this paper.

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“…Two geometries were proposed for these devices, differing in the aspect ratio of the electrodes (i.e. the electrode length divided by the inner electrode diameter): the Filippov configuration [1] with an aspect ratio <1 (typical values are 0.2) and the Mather configuration [2], with aspect ratio >1 (typically, [5][6][7][8][9][10].…”

Section: Introductionmentioning

confidence: 99%

“…The emitted neutrons can be applied to perform radiographs and substance analysis, taking advantage of the penetration and activation properties of neutral radiation. The intense x-ray pulses produced by bremsstrahlung radiation from localized electron beams and from hot spots are excellent candidates for radiography of moving or wet objects and for microelectronic lithography [8][9][10]. On the other hand, ion and electron beams from the plasma focus are used in surface treatment.…”

Section: Introductionmentioning

confidence: 99%

Optical observations of the plasma motion in a fast plasma focus operating at 50 J

Moreno

Silva

Soto³

2002

Plasma Sources Sci. Technol.

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Plasma images with 5 ns exposure time were obtained in a very small plasma focus. The plasma focus operates at low energy (160 nF capacitor bank, 65 nH, 25 kV, 50 J). A single frame ICCD camera was used to obtain plasma images in the visible range. The umbrella-like current sheath running over the end of the coaxial electrodes and the pinch after the radial collapse can be clearly observed in the photographs. The velocity of the radial collapse is of the order of 10 5 m s −1 . The observations are similar to the results obtained with devices operating at energies several orders of magnitude higher.

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<title>Preliminary results on x-ray lithography using a compact plasma focus</title>

Cited by 10 publications

References 0 publications

High rep rate high performance plasma focus as a powerful radiation source

High rep rate high performance plasma focus as a powerful radiation source

New trends and future perspectives on plasma focus research

Optical observations of the plasma motion in a fast plasma focus operating at 50 J

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