2004
DOI: 10.1117/12.577111
|View full text |Cite
|
Sign up to set email alerts
|

<title>Photolithography for the static compensation of human eye aberrations</title>

Abstract: Recent developments in human eye aberration measurements allow to design and fabricate compensating elements aiming to achieve aberration-limited imaging. This is important not merely from a subject's viewpoint (improving the sharpness of the outer world images formed at the retina) but mainly for clinical instrumentation purposes, especially those dealing with high-resolution retinal imaging (eye fundus cameras, scanning laser ophtlalmosopes, etc). Here we report recent developments in the correction of the s… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 28 publications
(29 reference statements)
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?