&lt;title&gt;Optical disk mastering an using optical superresolution effect&lt;/title&gt;

Tsai, Shih-Yaon; Hsieh, Tsung−Eong; Shieh, Han–Ping D.

doi:10.1117/12.390494

Cited by 2 publications

(3 citation statements)

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“…Finally, the results of the simulation of the line segment the fabrication model using super‐resolution NFP were compared with those of Tsai et al (), who conducted exposure on 10‐nm thick indium film using a far‐field laser beam source. The resulting fabrication widths in their experiment were

2.1 μ m

without indium coating and

1.3 μ m

with indium coating, resulting in a 38.1% reduction.…”

Section: Simulation and Analysis Of Line Segment Fabrication Using Sumentioning

confidence: 99%

“…Later, Kuwahara et al () applied metal mask layers to optical master disks. Shieh et al () and Tsai et al () coated photoresist with indium (In) for use in photolithographic fabrication using far‐field lasers, successfully reducing fabrication width by approximately 40%. They pointed out that the use of an etching solution (HF:H 2 O 2 :H 2 O = 1:1:4) enabled the removal of the indium film without damage to the photoresist.…”

Section: Introductionmentioning

confidence: 99%

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Nanoscale Line Segment Fabrication Using Super‐Resolution Near‐Field Photolithography

Yang¹

2012

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This study proposed a method to combine near-field photolithography (NFP) with thermally induced super-resolution, and conducted simulation and analysis on nanoscale line segment fabrication. A theoretical model of optical metal film was used to calculate the transmittance of indium film during line segment fabrication. A theoretical heat transfer model was employed to analyze the exposure power density on the surface of the photoresist after laser beams penetrated the indium film. This study divided the photoresist into finite nodes. Through a simulation combining an exposure energy density formula, an exposure model, and a developmental model, we derived the theoretical width and profile of the line segment fabricated using super-resolution NFP. The widths of the derived line segments were 88 nm for photoresist with indium coating and 130 nm without. The indium film accounted for a reduction in width of 32%.

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2.1 μ m

without indium coating and

1.3 μ m

with indium coating, resulting in a 38.1% reduction.…”

Section: Simulation and Analysis Of Line Segment Fabrication Using Sumentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Nanoscale Line Segment Fabrication Using Super‐Resolution Near‐Field Photolithography

Yang¹

2012

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“…Later, Kuwahara et al ('99) applied metal mask layers to optical master disks. Shieh et al (2001) and Tsai et al (2000) coated photoresist with indium (In) for use in photolithographic fabrication using far-field lasers, successfully reducing fabrication width by approximately 40%. They pointed out that the use of an etching solution (HF:H 2 O 2 :H 2 O = 1:1:4) enabled the removal of the indium film without damage to the photoresist.…”

Section: Introductionmentioning

confidence: 99%

Using Gray‐Based Taguchi Method to Construct Multi‐Objective Optimal Model in Super‐Resolution Near‐Field Photolithography

Yang

Chiang²

2012

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This study integrated thermally induced super-resolution into near-field photolithography and conducted simulation and analysis on line segment fabrication. This technique involves passing a laser beam through an aluminum-plated optical fiber probe onto a thin film of indium (approximately 10 nm thick). The indium film opens a melted aperture narrower than the width of the laser beam, creating a melted region and a crystalline region. The difference in penetration rate between the two regions leads to the generation of thermally induced super-resolution. This paper proposes a combination of Taguchi method with gray relational analysis, in which S/N ratios obtained using the Taguchi method are converted into gray relational grades to identify an optimal combination of parameters capable of meeting multiple quality objectives. This optimal combination includes a probe aperture of 100 nm (A1), exposure energy/μm of 0.002nJ/μm (B2), development time of 60 s (C3), and indium film with a thickness of 7 nm (D1). The optimal parameters were (A1B2C3D1) for the gray relational analysis and (A1B1C1D1) for the Taguchi method. Results showed a negative improvement of -14.3% in line width from 126.2 (Taguchi method) to 144.2 nm (gray relational analysis). Working depth, however, showed a significantly improvement of 140.4% from 5.7 (Taguchi method) to 13.7 nm (gray relational analysis). The proposed approach resolves the conflicts that commonly occur among factor levels in Taguchi analysis under the requirements of multiple quality requirements.

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<title>Optical disk mastering an using optical superresolution effect</title>

Cited by 2 publications

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Nanoscale Line Segment Fabrication Using Super‐Resolution Near‐Field Photolithography

Nanoscale Line Segment Fabrication Using Super‐Resolution Near‐Field Photolithography

Using Gray‐Based Taguchi Method to Construct Multi‐Objective Optimal Model in Super‐Resolution Near‐Field Photolithography

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