&lt;title&gt;Method for manufacturing high-quality gravure plates for printing fine-line electrical circuits&lt;/title&gt;

Hagberg, J.; Leppaevuori, Seppo

doi:10.1117/12.364499

Cited by 11 publications

(3 citation statements)

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“…As in other nanoimprint processes [22][23][24], the resolution of the RRI process chiefly depends on the resolution of the mould roller. There are various approaches to preparing a large-scale mould roller with micro/nanostructures, such as an electrolytic process [25] and roller etching by an etch mask [26]. In this paper, the mould roller is prepared by laser sculpturing, which can reach a micrometer-level resolution.…”

Section: Discussionmentioning

confidence: 99%

Investigation of ink transfer in a roller-reversal imprint process

Jiang

Ding

et al. 2008

J. Micromech. Microeng.

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Roller imprint is considered as one of the processes suitable for patterning on a large-area flexible substrate, which is critical for macroelectronics manufacturing. In contrast to other published roller imprint processes (such as hot-embossing roller imprint or ultraviolet roller imprint), the roller-reversal imprint (RRI) process investigated in this paper starts with pattern coating of an ink (mostly a liquefied electronics material, such as a semiconductor polymer) on a mould roller and ends with transferring the ink already patterned on the roller to the substrate, so it can obtain micropatterns with a precise profile yet leave no residual film on the substrate. One of the critical issues in obtaining patterned ink on the substrate with the required profile by the RRI process is to ensure a complete ink transfer from the microcavities on the mould roller onto the substrate. In this paper, a mathematical model is proposed to analyze the mechanics of the ink transfer, and a criterion for a complete ink transfer is derived. Furthermore, the effects of imprint force on the ink transfer are also demonstrated by an analysis of the elastic deformation of the substrate. The simulations and corresponding experiments show that the ink transfer in the RRI process is strongly dependent on the ratio of work of adhesion at the ink-mould and ink-substrate interfaces, and the critical ratio for a complete ink transfer is determined mainly by the profile of microcavities on the mould featured by the aspect ratio and the sidewall angle. The ink transfer model can be used to select proper materials (including the ink, surface energies of the mould roller and substrate) in the RRI process, and can also be regarded as a guideline for profile designing of the microcavities on the mould roller used in the RRI process.

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Section: Discussionmentioning

confidence: 99%

Investigation of ink transfer in a roller-reversal imprint process

Jiang

Ding

et al. 2008

J. Micromech. Microeng.

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“…20 This enabled the creation of highresolution (down to 9 mm) gravures with deep rectangular shaped grooves ($ 30 mm).…”

Section: Methodsmentioning

confidence: 99%

Printing parameters and ink components affecting ultra-fine-line gravure-offset printing for electronics applications

Pudas

Hagberg

Leppävuori

2004

Journal of the European Ceramic Society

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137

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“…There are three different engraving methods that can be used for fabricating gravure plate. These methods include wet etching, electroforming [7], and ultra-fast laser direct ablation. Fabricating gravure plate by electroforming is a replication process and not the original structuring process.…”

Section: Introductionmentioning

confidence: 99%

Ultrafast Laser Engraving Method to Fabricate Gravure Plate for Printed Metal-Mesh Touch Panel

et al. 2015

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Abstract:In order to engrave gravure plate with fine lines structures, conventional art used lithography with dry/wet etching. Lithography with dry/wet etching method allows to engrave lines with smooth concave shape, but its disadvantages include difficulty in controlling aspect ratio, high and uniform in large size process, substrate material limitation due to etching solution availability, and process complexity. We developed ultra-fast laser technology to directly engrave a stainless plate, a gravure plate, to be used for fabricating 23 in. metal-mesh touch panel by gravure offset printing process. The technology employs high energy pulse to ablate materials from a substrate. Because the ultra-fast laser pulse duration is shorter than the energy dissipation time between material lattices, there is no heating issue during the ablation process. Therefore, no volcano-type protrusion on the engraved line edges occurs, leading to good printing quality. After laser engraving, we then reduce surface roughness of the gravure plate using electro-polishing process. Diamond like carbon (DLC) coating layer is then added onto the surface to increase scratch resistance. We show that this procedure can fabricate gravure plate for gravure offset printing process with minimum printing linewidth 10.7 µm. A 23 in. metal-mesh pattern was printed using such gravure plate and fully functional touch panel was demonstrated in this work.

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<title>Method for manufacturing high-quality gravure plates for printing fine-line electrical circuits</title>

Cited by 11 publications

References 0 publications

Investigation of ink transfer in a roller-reversal imprint process

Investigation of ink transfer in a roller-reversal imprint process

Printing parameters and ink components affecting ultra-fine-line gravure-offset printing for electronics applications

Ultrafast Laser Engraving Method to Fabricate Gravure Plate for Printed Metal-Mesh Touch Panel

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