&lt;title&gt;Laterally graded multilayer optics for x-ray analysis&lt;/title&gt;

Schuster, M.; Goebel, H.; Bruegemann, Lutz; Bahr, David F.; Burgaezy, F.; Michaelsen, C.; Stoermer, Michael; Ricardo, Paulo; Dietsch, R.; Holz, Thomas; Mai, H.

doi:10.1117/12.371116

Cited by 38 publications

(14 citation statements)

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“…Theoretically, Ni/C multilayers have high normal incidence reflectivities in the ‘carbon-window’ wavelength region45 due to a large electron density contrast. They are also suited as monochromators for Cu Kα radiation in virtue of low divergence of the reflected beam and the superior suppression of Cu Kβ radiation678. Moreover, depth-graded Ni/C multilayers are used in astronomical telescopes in hard X-ray region910.…”

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Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

Peng

Huang

et al. 2016

Sci Rep

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The microstructure evolution of magnetron-sputtered Ni/C multilayers was investigated by varying the Ni and C layer thickness in the region of a few nanometers. For the samples having 2.6-nm-thick C layers, the interface width increases from 0.37 to 0.81 nm as the Ni layer thickness decreases from 4.3 to 1.3 nm. Especially for the samples with Ni layers less than 2.0 nm, the interface width changes significantly due to the discontinuously distributed Ni crystallites. For the samples having 2.8-nm-thick Ni layers, the interface width increases from 0.37 to 0.59 nm when the C layer thickness decreases from 4.3 to 0.7 nm. The evolution of interface microstructures with varied Ni and C layers is explained based on a proposed simple growth model of Ni and C layers.

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confidence: 99%

Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

Peng

Huang

et al. 2016

Sci Rep

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“…Furthermore, most modern X-ray analytical methods need a monochromatic beam. Synthetic multilayer mirrors are well established as excellent beam-shaping devices with a good spectral purity [1,2]. Their high reflectivity and broad rocking curve make them the ideal optics for conserving the source brilliance [3].…”

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D-10 Microfocusing X-ray Equipment for the Lab Diffractometer

Wiesmann¹,

Michaelsen²,

Graf³

et al. 2007

Powder Diffr.

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Results of a new stationary microfocusing sealed tube X-ray source are presented. Measurements with the new low-maintenance, high-brilliance microfocus source IµS equipped with different two-dimensional beam shaping multilayer optics are shown. The comparison of IµS with typical sealed tube fine focus systems shows data of outstanding quality in diffractometry applications using a two-dimensional detector. A huge improvement in intensity and resolution by a factor of about 16 was observed. The IµS delivers very promising results especially for measurements of powders in transmission geometry. The focusing on the detector enables better crystallite statistics and better resolution. For some applications there are even intensity gain factors in the range of 100 achievable. For small angle scattering a factor of 5 in comparison to a typical sealed tube instrument was observed when using an IµS with optics for a parallel beam.

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“…In the case of B 4 C we used the maximum deposition length of 1500 mm; for Pt we reduced the process to 500 mm in order to save cost and material. All coatings were investigated by means of X-ray reflectometry using Cu radiation (8048 eV) with parallel beams due to the use of Gö bel mirrors (Schuster & Gö bel, 1995;Schuster et al, 1999). A D8 Advance (Bruker AXS) diffractometer with reflectometry stage and knife edge was employed to investigate thin films on test and superpolished silicon substrates.…”

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Coatings for FEL optics: preparation and characterization of B₄C and Pt

et al. 2018

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Large X-ray mirrors are required for beam transport at both present-day and future free-electron lasers (FELs) and synchrotron sources worldwide. The demand for large mirrors with lengths up to 1 m single layers consisting of light or heavy elements has increased during the last few decades. Accordingly, surface finishing technology is now able to produce large substrate lengths with micro-roughness on the sub-nanometer scale. At the Helmholtz-Zentrum Geesthacht (HZG), a 4.5 m-long sputtering facility enables us to deposit a desired single-layer material some tens of nanometers thick. For the European XFEL project, the shape error should be less than 2 nm over the whole 1 m X-ray mirror length to ensure the safe and efficient delivery of X-ray beams to the scientific instruments. The challenge is to achieve thin-film deposition on silicon substrates, benders and gratings without any change in mirror shape. Thin films of boron carbide and platinum with a thickness in the range 30-100 nm were manufactured using the HZG sputtering facility. This setup is able to cover areas of up to 1500 mm Â 120 mm in one step using rectangular sputtering sources. The coatings produced were characterized using various thin-film methods. It was possible to improve the coating process to achieve a very high uniformity of the layer thickness. The movement of the substrate in front of the sputtering source has been optimized. A variation in B 4 C layer thickness below 1 nm (peak-to-valley) was achieved at a mean thickness of 51.8 nm over a deposition length of 1.5 m. In the case of Pt, reflectometry and micro-roughness measurements were performed. The uniformity in layer thickness was about 1 nm (peak-to-valley). The micro-roughness of the Pt layers showed no significant change in the coated state for layer thicknesses of 32 nm and 102 nm compared with the uncoated substrate state. The experimental results achieved will be discussed with regard to current restrictions and future developments.

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<title>Laterally graded multilayer optics for x-ray analysis</title>

Cited by 38 publications

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Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

D-10 Microfocusing X-ray Equipment for the Lab Diffractometer

Coatings for FEL optics: preparation and characterization of B₄C and Pt

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<title>Laterally graded multilayer optics for x-ray analysis</title>

Cited by 38 publications

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Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

Microstructure evolution with varied layer thickness in magnetron-sputtered Ni/C multilayer films

D-10 Microfocusing X-ray Equipment for the Lab Diffractometer

Coatings for FEL optics: preparation and characterization of B4C and Pt

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Product

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Coatings for FEL optics: preparation and characterization of B₄C and Pt