1993
DOI: 10.1117/12.154790
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<title>Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process</title>

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“…Some of the more common uses include the optimization of dye loadings in photoresist [31,32], simulation of substrate reflectivity [33,34], the applicability and optimization of top and bottom antireflection coatings [35,36], and simulation of the effect of bandwidth on swing curve amplitude [37,38]. In addition, simulation has been used to help understand the use of thick resists for thin film head manufacture [39] as well as other non-semiconductor applications.…”
Section: B Process Development Toolmentioning
confidence: 99%
“…Some of the more common uses include the optimization of dye loadings in photoresist [31,32], simulation of substrate reflectivity [33,34], the applicability and optimization of top and bottom antireflection coatings [35,36], and simulation of the effect of bandwidth on swing curve amplitude [37,38]. In addition, simulation has been used to help understand the use of thick resists for thin film head manufacture [39] as well as other non-semiconductor applications.…”
Section: B Process Development Toolmentioning
confidence: 99%