&lt;title&gt;Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process&lt;/title&gt;

Johnson, Jeffrey R.; Stagaman, Gregory J.; Sardella, John C.; Spinner, Charles R.; Liou, Fu‐Tai; Trefonas, Peter; Meister, Catherine C.

doi:10.1117/12.154790

Cited by 2 publications

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“…Some of the more common uses include the optimization of dye loadings in photoresist [31,32], simulation of substrate reflectivity [33,34], the applicability and optimization of top and bottom antireflection coatings [35,36], and simulation of the effect of bandwidth on swing curve amplitude [37,38]. In addition, simulation has been used to help understand the use of thick resists for thin film head manufacture [39] as well as other non-semiconductor applications.…”

Section: B Process Development Toolmentioning

confidence: 99%

Thirty years of lithography simulation

Mack

2005

Optical Microlithography XVIII

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Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation -the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today's indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.

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Section: B Process Development Toolmentioning

confidence: 99%

Thirty years of lithography simulation

Mack

2005

Optical Microlithography XVIII

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<title>Lithographic simulation: a review</title>

Mack

2001

SPIE Proceedings

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A review of the current state of the art in optical and electron beam lithography simulation is presented. Basic physical models are described and examples are given. In addition, rigorous electromagnetic simulation for mask topography is shown and the use of statistical modeling to predict feature size distributions in manufacturing is described. Finally, numerous examples of the use of lithography simulation and its impact on the semiconductor industry are offered.

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<title>Effects of absorptive dye loading and substrate reflectivity on a 0.5-micron i-line photoresists process</title>

Cited by 2 publications

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Thirty years of lithography simulation

Thirty years of lithography simulation

<title>Lithographic simulation: a review</title>

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