&lt;title&gt;Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor&lt;/title&gt;

Partlo, William N.; Fomenkov, Igor V.; Oliver, Ian Roger; Birx, D.L.

doi:10.1117/12.390041

Cited by 26 publications

(15 citation statements)

References 1 publication

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“…The general types of the DPP devices which can be simulated within the HEIGHTS-EUV package are schematically shown in Figure 1: a) A dense plasma focus device, b) A hollow cathode triggered pinch plasma source, and c) A Z-pinch device [1][2][3][4]. The electrodes are drawn solid and shown in grey color.…”

Section: Introductionmentioning

confidence: 99%

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

et al. 2004

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Discharge produced plasma (DPP) devices are being used as a light source for Extreme Ultraviolet (EUV) Lithography. A key challenge for DPP is achieving sufficient brightness to support the throughput requirements of exposure tools for high-volume manufacturing lithography. An integrated model is being developed to simulate the environment of the EUV source and optimize the output of the source. The model describes the hydrodynamic and optical processes that occur in DPP devices. It takes into account plasma evolution and magnetohydrodynamic processes as well as detailed photon radiation transport. The total variation diminishing scheme in the Lax-Friedrich formulation for the description of magnetic compression and diffusion in a cylindrical geometry is used. Several models are being developed for opacity calculations: a collisional radiation equilibrium model, a self-consistent field model with Auger processes, and a non-stationary kinetic model. Radiation transport for both continuum and lines with detailed spectral profiles is taken into account. The developed models are being integrated into the HEIGHTS-EUV computer simulation package. Preliminary results of a numerical simulation of xenon gas hydrodynamics and EUV radiation output are presented for various plasma conditions.

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Section: Introductionmentioning

confidence: 99%

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

et al. 2004

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“…Experimentally demonstrated CE of an Sn plasma EUV source is at most 2% so far. Only a few experiments using lithium were reported [1]. The other method is to optimize the plasma temperature and density for 13.5 nm emission.…”

Section: Introductionmentioning

confidence: 98%

Extreme Ultraviolet Radiation from Z-pinch Plasmas for Next Generation Lithography

Akiyama¹,

Katsuki²,

Namihira³

et al. 2006

Conference Record of the 2006 Twenty-Seventh International Power Modulator Symposium

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Development of the high power EUV (extreme ultraviolet) source has been expected as a light source for the next generation lithography. There are two kinds of EUV sources: the discharge produced plasma (DPP) and the laser produced plasma (LPP). The DPP method is considered to be promising in easiness of radiating the high power EUV and in the cheapness of constructing the EUV source. The Zpinch plasmas driven by pulsed power have been used mainly in the DPP method. Here, the research results of the DPP method at Kumamoto University are summarized.

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“…The goal of this paper is to provide our initial simulation of MHD and optical processes that occur in DPP devices of standard Mather-type electrode construction [1]. Such a device is schematically shown in Fig 1. The electrodes are shown in dark color and are of equal height.…”

Section: Introductionmentioning

confidence: 99%

HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography

et al. 2003

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Discharge produced plasma (DPP) devices have been proposed as a light source for EUV lithography. A key challenge for DPP is achieving sufficient brightness to support the throughput requirements of exposure tools for high-volume manufacturing lithography. To simulate the environment of the EUV source and optimize the output of the source, an integrated model is being developed to describe the hydrodynamic and optical processes that occur in DPP devices. The model includes both plasma evolution and magnetohydrodynamic processes as well as detailed photon radiation transport. The total variation diminishing scheme in the Lax-Friedrich formulation for the description of magnetic compression and diffusion in a cylindrical geometry is used. Several models are being developed for opacity calculations; a collisional radiation equilibrium model, a self-consistent field model with Auger processes, and a nonstationary kinetic model. Radiation transport for both continuum and lines with detailed spectral profiles are taken into account. The developed models are integrated into the HEIGHTS-EUV computer simulation package. Preliminary results of a numerical simulation of xenon gas hydrodynamics and line radiation output are presented for various plasma conditions.

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<title>Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor</title>

Cited by 26 publications

References 1 publication

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

Simulation and optimization of DPP hydrodynamics and radiation transport for EUV lithography devices

Extreme Ultraviolet Radiation from Z-pinch Plasmas for Next Generation Lithography

HEIGHTS initial simulation of discharge-produced plamsa hydrodynamics and radiation transport for EUV lithography

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