1992
DOI: 10.1117/12.135930
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<title>Design of a large-format charge-injection-device imager for spectroscopy</title>

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“…The signal charge injection takes place by biasing IG to approximately VSS, and turning QRD off and QRS on such that FG is approximately VSS. The reverse-biased p-n junction can be a buried (vertical) one such as that of a charge injection device (OlD), see, for example, [4]. In this case, the substrate material on which the active pixel is built must be of opposite type to that of the epitaxial layer.…”
mentioning
confidence: 99%
“…The signal charge injection takes place by biasing IG to approximately VSS, and turning QRD off and QRS on such that FG is approximately VSS. The reverse-biased p-n junction can be a buried (vertical) one such as that of a charge injection device (OlD), see, for example, [4]. In this case, the substrate material on which the active pixel is built must be of opposite type to that of the epitaxial layer.…”
mentioning
confidence: 99%