Abstract:This paper describes the intra-field registration error caused by the mix of exposure illumination and isolation process independently. Modified illuminations such as annular, quadrupole, and small sigma aperture for phase shift mask are widely used to extend the feasible limits in the current optical process application. Meanwhile, each of illumination conditions may cause the deterioration of the intra-field registration since they have different optical properties. Also isolation process in CMOS has been co… Show more
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