Articles you may be interested inStrain-compensation measurement and simulation of InGaAs/GaAsP multiple quantum wells by metal organic vapor phase epitaxy using wafer-curvature J. Appl. Phys. 110, 113501 (2011); 10.1063/1.3663309 Erratum: "Size-dependent photoluminescence of hexagonal nanopillars with single InGaAs/GaAs quantum wells fabricated by selective-area metal organic vapor phase epitaxy" [Appl. Phys. Lett. 89, 203110 (2006)] Appl. Phys. Lett. 92, 059901 (2008); 10.1063/1.2841828 Spectroscopic characterization of 1.3 μ m GaInNAs quantum-well structures grown by metal-organic vapor phase epitaxy Appl. Phys. Lett. 86, 092106 (2005); 10.1063/1.1868866Effect of growth temperature on strain barrier for metalorganic vapor phase epitaxy grown strained InGaAs quantum well with lattice matched InGaAsP barriers Photoluminescence microscopy imaging of tensile strained In 1−x Ga x As y P 1−y / InP quantum wells grown by low-pressure metalorganic vapor phase epitaxy Highly strained In x Ga 1−x As/ GaAs double quantum well ͑DQW͒ structures grown by metal organic vapor phase epitaxy with different In compositions are investigated by surface photovoltage spectroscopy ͑SPS͒ in the temperature range 20-300 K. A lineshape fit of spectral features in the differential surface photovoltage ͑SPV͒ spectra determines the transition energies accurately. A comprehensive analysis of the anomalous phenomena appearing in lower temperature SPV spectra enable us to evaluate directly the band lineup of DQW and to remove the ambiguity in the identification of spectral features. The process of separation of carriers within the QW with possible capture by the interface defect traps plays an important role for phase change in SPV signal in the vicinity of light-hole related feature at low temperature. The results demonstrate the considerable diagnostic values of the SPS technique for characterizing these highly strained DQW structures.