Lowering the activation temperature of TiZrV non-evaporable getter films

Prodromides, A.E; Scheuerlein, C.; Taborelli, M.

doi:10.1016/s0042-207x(00)00243-8

Cited by 64 publications

(47 citation statements)

References 12 publications

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“…The O-KLL peak intensity decreases, the Zr-MNV line shape is initially characteristic of Zr in ZrO 2 and changes to the shape of metallic Zr, the C-KLL peak shape changes from graphitic to carbidic and a Cl-LMM peak grows [10]. As an example, the O-KLL intensity variation with increasing heating temperature is shown in Fig.…”

Section: In¯uence Of the Heating Temperature On The Elemental Surfacementioning

confidence: 94%

The secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings

Henrist

Hilleret

Scheuerlein

et al. 2001

Applied Surface Science

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The secondary electron yield (SEY) of two different non-evaporable getter (NEG) samples has been measured`as received' and after thermal treatment. The investigated NEGs are TiZr and TiZrV thin ®lm coatings of 1 mm thickness, which are sputter deposited onto copper substrates. The maximum SEY d max of the air exposed TiZr and TiZrV coating decreases from above 2.0 to below 1.1 during a 2 h heat treatment at 250 and 2008C, respectively.Saturating an activated TiZrV surface under vacuum with the gases typically present in ultra-high vacuum systems increases d max by about 0.1. Changes in elemental surface composition during the applied heat treatments were monitored by Auger electron spectroscopy (AES). After activation carbon, oxygen and chlorine were detected on the NEG surfaces. The potential of AES for detecting the surface modi®cations which cause the reduction of SE emission during the applied heat treatments is critically discussed. #

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Section: In¯uence Of the Heating Temperature On The Elemental Surfacementioning

confidence: 94%

The secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings

Henrist

Hilleret

Scheuerlein

et al. 2001

Applied Surface Science

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“…Their findings have shown that sputtered TiZrV alloys of nearly equal ratios can be activated at 180 • C, and using these coatings they have demonstrated the lowest room temperature vacuum of 10 −14 mbar 119 . The pumping rate of NEG films depends on their surface area and so the CERN team have also looked into the effects of substrate and deposition parameters to increase pumping rates and capacities 120 . Additional attractive properties of TiZrV NEG films are their high adhesion, thermal and vibration stability, resilience to standard wafer cleaning processes, and commercial availability 121 .…”

Section: A Pumpingmentioning

confidence: 99%

Contributed Review: The feasibility of a fully miniaturized magneto-optical trap for portable ultracold quantum technology

Rushton

Aldous

Himsworth

2014

Review of Scientific Instruments

104

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Experiments using laser cooled atoms and ions show real promise for practical applications in quantumenhanced metrology, timing, navigation, and sensing as well as exotic roles in quantum computing, networking and simulation. The heart of many of these experiments has been translated to microfabricated platforms known as atom chips whose construction readily lend themselves to integration with larger systems and future mass production. To truly make the jump from laboratory demonstrations to practical, rugged devices, the complex surrounding infrastructure (including vacuum systems, optics, and lasers) also needs to be miniaturized and integrated. In this paper we explore the feasibility of applying this approach to the Magneto-Optical Trap; incorporating the vacuum system, atom source and optical geometry into a permanently sealed microlitre system capable of maintaining 10 −10 mbar for more than 1000 days of operation with passive pumping alone. We demonstrate such an engineering challenge is achievable using recent advances in semiconductor microfabrication techniques and materials.PACS numbers: 07.07.Df, 37.10.Gh, 07.30.Kf, I. ULTRACOLD QUANTUM TECHNOLOGYSince the first demonstrations of atoms and ions at sub-millikelvin temperatures in the mid-1980s, the field of atomic physics has been revolutionized by laser cooling and trapping as it provides researchers with a method to probe some of the purest and sensitive quantum systems available. This field is still highly productive and recently has put significant emphasis on the practical applications of this technology beyond the laboratory 1,2 . It was evident very early on that ultracold matter would be an indispensable tool in precise timing applications and a recent demonstration 3 has shown extremely low instabilities at the 10 −18 level. The wavelike nature of atoms as they are cooled to lower temperatures can be used to form atomic interferometers that outperform optical counterparts in measurements of accelerated reference frames 4-7 , which are important for inertial guidance systems, but can also provide sensitive measurements of mass, charge and magnetic fields [8][9][10][11] . Greater sensitivity beyond the classical limit is possible via squeezed 12 and entangled states 13-15 , which are also fundamental attributes for quantum computing 16,17 , and long distance quantum networking 18 . Ultracold matter has been used in the emerging field of quantum simulation 19 and is an indispensable tool in determining fundamental constants 20 , testing general relativity 21 and defining measurement standards 22 . Many researchers and industries believe such tools will be a major part of the 'second quantum revolution' in which the more 'exotic' properties of quantum physics are applied for practical applications 23,24 .The field of ultracold matter has reached a matua) m.d.himsworth@soton.ac.uk rity in both experimental methods and theoretical understanding allowing experiments to begin leaving the laboratory 25-27 . These systems are bespoke, rarely take up a ...

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“…Films of different compositions were produced [5,9] on coupon samples made of different materials by means of a dedicated system equipped with a planar sputtering source for each of the three elements. The samples were characterised by Auger Electron Spectroscopy (AES) [17] and their performances ranked by the ratio between the intensity of metallic and oxide Zr lines after a defined thermal cycle (200°C for 1 h).…”

Section: General Properties Of Ti-zr-v Filmsmentioning

confidence: 99%

“…With regard to the kinetic parameter, an enhanced diffusion can be achieved in the elements of the fourth group by adding other elements that either enlarge the lattice space (increased bulk diffusivity) [7,8] or reduce the grain size and, as a result, increase the transport of oxygen through the grain boundaries. The latter approach was successfully verified for Ti-Zr-V alloys where compositions with very low activation temperatures are unambiguously associated with grains of nanometric size (about 3 to 5 nm) [5,9]. The activation of these films can be obtained by heating at 180°C for 24 h, which renders Ti-Zr-V films compatible with all the substrate materials used in vacuum technology [10].…”

Section: Introductionmentioning

confidence: 99%

Ti–Zr–V non-evaporable getter films: From development to large scale production for the Large Hadron Collider

Chiggiato

Pinto

2006

Thin Solid Films

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Non-evaporable getter (NEG) alloys after dissolution of their native oxide layer into the bulk are able to pump most of the gases present in ultra-high vacuum systems. The dissolution process, commonly called activation, is obtained by heating in vacuum. NEG materials can be sputter-deposited as a thin film on the inner wall of a vacuum chamber, transforming it from a source of gas into an effective pump. The most significant advance in the development of NEG films was the discovery of a very low activation temperature (180°C for 24 h heating) in a large range of compositions of the Ti-Zr-V system. This favourable property was correlated with nanometric grain size of the film (about 3 to 5 nm).In addition to pumping, NEG films lead to reduced induced gas desorption and secondary electron yields. As a consequence, Ti-Zr-V films provide the optimum solution to most of the problems encountered in vacuum systems of modern particle accelerators for high energy physics and for synchrotron radiation facilities. In the near future the most significant benchmark for Ti-Zr-V films will be the Large Hadron Collider (LHC) presently under construction at CERN, where about 6 km of beam pipe are being coated. A dedicated magnetron sputtering facility has been built to cope with the high number of vacuum chambers (about 1200) and the tight production schedule.

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Lowering the activation temperature of TiZrV non-evaporable getter films

Cited by 64 publications

References 12 publications

The secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings

The secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings

Contributed Review: The feasibility of a fully miniaturized magneto-optical trap for portable ultracold quantum technology

Ti–Zr–V non-evaporable getter films: From development to large scale production for the Large Hadron Collider

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