2012
DOI: 10.1002/cphc.201200526
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Lowering Energy Barriers in Surface Reactions through Concerted Reaction Mechanisms

Abstract: Any technologically important chemical reaction typically involves a number of different elementary reaction steps consisting of bond-breaking and bond-making processes. Usually, one assumes that such complex chemical reactions occur in a step-wise fashion where one single bond is made or broken at a time. Using first-principles calculations based on density functional theory we show that the barriers of rate-limiting steps for technologically relevant surface reactions are significantly reduced if concerted r… Show more

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Cited by 20 publications
(28 citation statements)
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“…Thereby this concerted process may require considerably less activation energy than the monatomic migration of chemisorbed H atoms into the subsurface. This was recently demonstrated by Groß and co-workers, 45,48 who traced the events following H 2 dissociation on H-precovered Pd(100) with ab initio molecular dynamics simulations on DFT potential energy surfaces. According to their results, 45 the energy barrier for an excess H atom to settle from a bridge position into a neighboring fourfold hollow site while the H atom chemisorbed at that site simultaneously penetrates into the subsurface amounts to only 0.06 eV.…”
mentioning
confidence: 72%
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“…Thereby this concerted process may require considerably less activation energy than the monatomic migration of chemisorbed H atoms into the subsurface. This was recently demonstrated by Groß and co-workers, 45,48 who traced the events following H 2 dissociation on H-precovered Pd(100) with ab initio molecular dynamics simulations on DFT potential energy surfaces. According to their results, 45 the energy barrier for an excess H atom to settle from a bridge position into a neighboring fourfold hollow site while the H atom chemisorbed at that site simultaneously penetrates into the subsurface amounts to only 0.06 eV.…”
mentioning
confidence: 72%
“…For 0.5 ML H on Pd(100) in a (2 × 2) arrangement that provides no neighboring vacancies, H 2 dissociates through a molecular precursor near the H-vacancy over a barrier of 0.1 eV, placing one H atom into the empty fourfold hollow chemisorption site and an excess H atom into the adjacent bridge position. [45][46][47][48] Activation barriers for H 2 dissociation also develop at high H coverages on Pd(111). 49,50 These theoretical results indicate that (in contrast to bare Pd surfaces) the dissociation of H 2 in high coverage regimes becomes impeded by small activation barriers that are well comparable to the experimental E abs values.…”
Section: H 2 Dissociation As Rdsmentioning
confidence: 99%
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“…This demonstrates an additional active role of CO in the C 1 reduction process over 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 approaches, carefully narrowing down transition states, and finally estimating thermodynamic corrections by virtue of harmonic analysis using the optimized structures. 6,[81][82][83][84][85]88 Applying this traditional approach to low-index Cu surfaces and unsupported Cu clusters, three different reaction mechanisms were proposed: the so-called HCOO -, CO and COOH + based mechanisms (for a recent review see Ref. 77).…”
Section: Active Role Of Cu 8 /Zno(0001)mentioning
confidence: 99%