2016
DOI: 10.1016/j.solmat.2016.01.009
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Low-temperature synthesis of thermochromic vanadium dioxide thin films by reactive high power impulse magnetron sputtering

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Cited by 71 publications
(29 citation statements)
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“…The temperature is typically~450 • C although lower temperatures can be used for special sputtering techniques employing pulsed plasma [63][64][65][66][67]. The required process control is difficult, and vanadium is rapidly oxidized at high temperature and transforms from tetragonal VO 2 to V 6 O 13 and V 3 O 7 , and it ultimately reaches thermodynamically stable orthorhombic V 2 O 5 in agreement with the phase diagram in Figure 4 (we come back to this point in Section 4).…”
Section: On the Preparation Of Vanadium Dioxide (Vo2) Thin Films And supporting
confidence: 52%
“…The temperature is typically~450 • C although lower temperatures can be used for special sputtering techniques employing pulsed plasma [63][64][65][66][67]. The required process control is difficult, and vanadium is rapidly oxidized at high temperature and transforms from tetragonal VO 2 to V 6 O 13 and V 3 O 7 , and it ultimately reaches thermodynamically stable orthorhombic V 2 O 5 in agreement with the phase diagram in Figure 4 (we come back to this point in Section 4).…”
Section: On the Preparation Of Vanadium Dioxide (Vo2) Thin Films And supporting
confidence: 52%
“…Moreover, scaling VO 2 particles to nanoscale offers the possibility to further enhance its thermochromic performance at a moderate τ c . Several chemical and physical techniques have been reported to construct nanostructures of thermochromic VO 2 , including hydrothermal, magnetron sputtering, CVD, PVD, sol–gel, confined‐space combustion method, electrochemical and solution methods . Among them, vapor deposition is an efficient method for high quality VO 2 ‐film fabrication, but the equipment required for the film deposition is usually complex and expensive; a solution‐based deposition process is more cost effective, high‐yielding, and flexible, but it always suffers from multiple‐steps, lower purity, and small‐scale production .…”
Section: Introductionmentioning
confidence: 99%
“…The ion assistance in reactive HiPIMS has been successfully employed for deposition of various compound thin films with improved properties. For instance to control the phase formation in TiAlN 4 or TiO 2 5 ; reducing the growth temperature of thermochromic VO 2 ; 6,7 controlling the crystal orientation of α-Fe 2 O 3 ; 8 or increasing the value of refractive index of Ta 2 O 5 .…”
Section: Introductionmentioning
confidence: 99%