Low-temperature synthesis of 2D anisotropic MoTe₂ using a high-pressure soft sputtering technique

Abstract

High-pressure soft sputtering: large area 1T′ phase MoTe2 thin films were grown at temperatures as low as 300 °C.

Tailoring the surface properties of molybdenum oxytelluride thin films by its compositional ratio

“…Jamal et al fabricated nickel oxide TFs at 50 W and 90 min 50 . In addition, the crystallization temperature of MoTe 2 was found to be above 573 K 51 . These are harsher conditions than our study.…”

“…Lu et al fabricated zinc oxide TFs from 100 to 250 W and annealed at 875 K. 49 Jamal et al fabricated nickel oxide TFs at 50 W and 90 min. 50 In addition, the crystallization temperature of MoTe 2 was found to be above 573 K. 51 These are harsher conditions than our study. In this study, we fabricated MOT-X TFs at room temperature with an average power of 25 W and an average sputtering time of 15 min.…”