Amorphous or polycrystalline tantalum pentoxide (Ta2O5) films with high resistance have been widely used in semiconductor devices as insulating dielectric layers. In this work, tungsten (W) doped δ-Ta2O5 (0001) monocrystal films were deposited on Y-stabilized ZrO2 (111) substrates using a pulsed laser deposition system. The lattice structure, heteroepitaxial relationship, and electrical properties of the films were analyzed in detail. The carrier concentration, Hall mobility, and resistivity of the 2% W doped δ-Ta2O5 film are 6.61 × 1015 cm−3, 65.2 cm2/V s and 14.5 Ω cm, respectively. High performance metal–semiconductors–metal ultraviolet (UV) detectors based on the W doped δ-Ta2O5 films were fabricated. The UV detector based on a 2% W doped δ-Ta2O5 film exhibits a high photo responsivity of 10.32 A/W and a photocurrent-to-darkcurrent ratio of 1.3 × 104. The performances of the UV detectors in this work are so high, which indicates that the W doped δ-Ta2O5 films can be applied in UV detectors as an active layer.