Low-temperature refractory metal film deposition

Solanki, R.; Boyer, P.; Collins, G. J.

doi:10.1063/1.93389

Cited by 95 publications

(12 citation statements)

References 9 publications

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“…At 10 W the deposition rate was high (83 A/min) and the films showed high resistivity (27 ml-I cm). Above this value the rates are fairly constant (17 ]k/min). The metal content increased with power, and the carbon content remained at 1-2% (Fig.…”

Section: Reaction Of W(co)6 In Ar/h2mentioning

confidence: 91%

Plasma reaction of group VI metal carbonyls

Suhr

Schmid

Stürmer

1992

Plasma Chem Plasma Process

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Section: Reaction Of W(co)6 In Ar/h2mentioning

confidence: 91%

Plasma reaction of group VI metal carbonyls

Suhr

Schmid

Stürmer

1992

Plasma Chem Plasma Process

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“…The aperture system contains no sliding pieces, thus avoiding the jitter and mechanical instability associated with friction. Since the aperture is being imaged onto the photomask surface, the minimization of mechanical vibrations associated with the variable 3. LASER, OPTICAL, AND IMAGING SYSTEMS A gain-switched Ti:Sapphire laser system is used on the repair unit.…”

Section: Mechanical Systemmentioning

confidence: 99%

High-resolution repair of photomasks using a deep-UV-laser-based defect repair system

et al. 1995

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A laser-based defect repair system developed at Excel/Quantronix is designed to repair photomasks with sub-micron resolution. The laser of the repair unit consists of a gain-switched Ti:Sapphire system configured to operate at 248 nm. The deep-UV light is obtained by frequency tripling the fundamental Ti:Sapphire wavelength. The Ti:Sapphire laser system generates pulses with temporal duration of approximately 12 ns and pulse energies up to -5O iJ at repetition rates from single-shot to 500Hz. This solid-state laser system provides good pulse-to-pulse stability and excellent beam quality, features that are necessary for high resolution repairs. The repair unit is based on a state-of-the-art airbearing positioning system with nm in-position stability. The accompanying optical system is designed to include a high-resolution microscope providing transmitted light illumination (248 nm and 365 nm) and reflected light illumination. A series of CCD cameras provide high resolution viewing at various magnifications. The system capabilities include sub-micron repair of both clear and opaque defects in an open-air environment by laser ablation and laser-assisted photolytic deposition. The optical system for laser processing and delivery is designed for diffraction-limited performance. Clear and opaque repair results performed on binary photomasks are presented.

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“…For example, detailed results are available for nickel [1][2][3] and for chromium [4][5][6][7][8][9][10][11][12][13][14][15].…”

Section: Laser-induced Chemical Vapor Deposition (Licvd)mentioning

confidence: 99%

Mechanism of Chromium Deposition from Cr(CO)₆ by Uv Laser Light

Nowak

Hess

1989

MRS Proc.

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The mechanism of metal film deposition from carbonyls as precursors is discussed in detail. It is shown that different species produced by UV laser irradiation in the gas phase contribute to film growth. Highly reactive species such as metal atoms may be important during the nucleation phase, whereas more stable carbonyls are responsible for the main growth process. This indicates that the main decarbonylation effect occurs at the surface. The higher level of impurity incorporation in chromium films in comparison with nickel films is explained by the relative position of the Fermi level in the d-band of Ni and Cr with respect to the 2v* level of CO, which favors CO bond dissociation in the case of chromium.

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Low-temperature refractory metal film deposition

Cited by 95 publications

References 9 publications

Plasma reaction of group VI metal carbonyls

Plasma reaction of group VI metal carbonyls

High-resolution repair of photomasks using a deep-UV-laser-based defect repair system

Mechanism of Chromium Deposition from Cr(CO)₆ by Uv Laser Light

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Low-temperature refractory metal film deposition

Cited by 95 publications

References 9 publications

Plasma reaction of group VI metal carbonyls

Plasma reaction of group VI metal carbonyls

High-resolution repair of photomasks using a deep-UV-laser-based defect repair system

Mechanism of Chromium Deposition from Cr(CO)6 by Uv Laser Light

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Mechanism of Chromium Deposition from Cr(CO)₆ by Uv Laser Light