2010
DOI: 10.1002/pssc.200982782
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Low temperature processed p‐type bottom gate microcrystalline silicon thin film transistors

Abstract: We report on processing of p‐type bottom gate microcrystalline silicon thin film transistors (p‐type BG TFT). In particular, we demonstrate that a thermal annealing at 250 °C is required to get ideal contacts, regardless of the drain‐source met al. We found that aluminium is the best suited metal for source and drain contacts, as in the case of n‐type thin film transistors.The TFTs mobility and sub‐threshold slope (V/dec) are improved when a hydrogen plasma treatment was applied to the a‐SiN:H prior to µc‐Si d… Show more

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Cited by 3 publications
(2 citation statements)
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References 12 publications
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“…For this application, the use of complementary devices, n-and p-type transistors, is attractive since this technology allows for the implementation of efficient digital circuits. Although complementary metal oxide semiconductor (CMOS) logic circuits, based on separated n-and p-type doped deposited layers, are currently under development [1], the use of ambipolar TFTs, operating as either p-or n-type transistors, can simplify the design and reduce the cost for the fabrication of the complementary logic circuits. Hydrogenated amorphous silicon (a-Si:H) has been typically used as the active layer of TFTs.…”
Section: Introductionmentioning
confidence: 99%
“…For this application, the use of complementary devices, n-and p-type transistors, is attractive since this technology allows for the implementation of efficient digital circuits. Although complementary metal oxide semiconductor (CMOS) logic circuits, based on separated n-and p-type doped deposited layers, are currently under development [1], the use of ambipolar TFTs, operating as either p-or n-type transistors, can simplify the design and reduce the cost for the fabrication of the complementary logic circuits. Hydrogenated amorphous silicon (a-Si:H) has been typically used as the active layer of TFTs.…”
Section: Introductionmentioning
confidence: 99%
“…As opposed to unipolar silicon metal oxide semiconductor (MOS) devices whose p-type or n-type behavior is determined during fabrication, ambipolar devices can be switched from p-type to n-type by changing the gate bias. Although complementary thin-film CMOS logic circuits, based on separated n-and p-type doped deposited layers, are currently under development [17], the use of ambipolar TFTs can simplify the design and reduce the cost for the fabrication of the complementary logic circuits. Ambipolar and unipolar conductions are illustrated by the transfer curves of TFTs in Figure 1.2.…”
Section: Ambipolar Thin-film Transistorsmentioning
confidence: 99%