Abstract:Low temperature process technologies for high performance polycrystalline silicon (poly-Si) thin-film transistors (TFTs) are discussed based on the investigations of pulsed laser crystallization, plasma treatment of poly-Si films, and SiO 2 /Si interface formation. Although high density (~10 18 cm -3 ) trap states localized at grain boundaries are introduced to the poly-Si films by laser crystallization, they are efficiently decreased to the order of 10 16 cm -3 by following hydrogen plasma treatment. It is al… Show more
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