2017
DOI: 10.1186/s11671-017-1906-2
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Low-Temperature PLD-Growth of Ultrathin ZnO Nanowires by Using Zn x Al1−x O and Zn x Ga1−x O Seed Layers

Abstract: ZnO nanowires (NWs) are used as building blocks for a wide range of different devices, e.g. light emitters, resonators, and sensors. Integration of the NWs into such structures requires a high level of NWs’ diameter control. Here, we present that the doping concentration of ZnxAl1−xO and ZnxGa1−xO seed layers has a strong impact on the NW growth and allows to tune the diameter of the NWs by two orders of magnitude down to less than 7 nm. These ultrathin NWs exhibit a well-oriented vertical growth and thus are … Show more

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Cited by 13 publications
(4 citation statements)
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References 32 publications
(33 reference statements)
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“…Very thin ZnO nanowires have not often described in the literatures [29][30][31][32]. However, the synthesizing procedure must engage more than one step in order to get the wished thin NW`s.…”
Section: Tem and Edx Mapping Studymentioning
confidence: 99%
“…Very thin ZnO nanowires have not often described in the literatures [29][30][31][32]. However, the synthesizing procedure must engage more than one step in order to get the wished thin NW`s.…”
Section: Tem and Edx Mapping Studymentioning
confidence: 99%
“…For instance, the art of pre-patterning the substrate in the bottom-up approach along with the vapor-liquidsolid growth process yields a well-defined ordered array of vertically aligned NWs [12,13]. However, the commonly adapted NW synthesis processes are discharge [14], cation exchange [15], chemical vapor deposition [16], electrodeposition [17], laser ablation [18], selected-control deposition [16], the sol-gel method [19], thermal decomposition [20], and template methods [21,22]. Among these techniques, the template-assisted method, particularly porous anodic aluminum oxide (AAO, i.e., Al 2 O 3 ), has been extensively reported due to its simple fabrication process and low cost [21].…”
Section: Introductionmentioning
confidence: 99%
“…Accordingly, ZnO material is expected to be more promising than the current mainstream GaN-based device for short-wavelength optoelectronic applications [1][2][3][4]. Additionally, the growth in technology and temperature necessary to realize a ZnO film with quality c-axis crystallization is much simpler, such as when done by sputtering, pulse laser deposition, and hydrothermal methods, rather than for the epitaxial GaN layer, resulting in potentially low-cost fabrications and processes for ZnO-based devices [5][6][7][8]. Among these deposition methods, sputtering technology is a commercially used method for preparing large-area and cost-efficient polycrystalline ZnO layers on various substrates in applications for optoelectronic devices at a relatively low temperature.…”
Section: Introductionmentioning
confidence: 99%