1998
DOI: 10.1007/s003390050632
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Low-temperature photoluminescence in SiGe single quantum wells

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Cited by 6 publications
(3 citation statements)
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“…We can imagine that the upper SiGe layers in the MQWs are highly strained during the epitaxial growth and thus tend to form SiGe QDs to relieve the accumulated strain. Many studies have proposed the type II band alignment for both SiGe/Si MQW and MQD structures [34,35]. In a type II alignment, the indirect excitons are first localized at the hetero-interfaces and then recombine.…”
Section: Resultsmentioning
confidence: 99%
“…We can imagine that the upper SiGe layers in the MQWs are highly strained during the epitaxial growth and thus tend to form SiGe QDs to relieve the accumulated strain. Many studies have proposed the type II band alignment for both SiGe/Si MQW and MQD structures [34,35]. In a type II alignment, the indirect excitons are first localized at the hetero-interfaces and then recombine.…”
Section: Resultsmentioning
confidence: 99%
“…13) There are many studies on nanostructured Si, Ge, and SiGe alloys for next-generation photonics devices. [14][15][16][17][18][19][20][21] Studies reported that they have a high potential as lasers and photodetectors by incorporating quantum structures, despite being indirect-transition-type semiconductors in the studies of superlattices and multi-quantum wells. 18,19) Furthermore, it is very easy to change the optical conversion energy and the lattice constant by changing the size effect and the Ge composition.…”
Section: Introductionmentioning
confidence: 99%
“…[14][15][16][17][18][19][20][21] Studies reported that they have a high potential as lasers and photodetectors by incorporating quantum structures, despite being indirect-transition-type semiconductors in the studies of superlattices and multi-quantum wells. 18,19) Furthermore, it is very easy to change the optical conversion energy and the lattice constant by changing the size effect and the Ge composition. The degree of difficulty expected for fabrication of SiGe quantum dots on group-IV semiconductors is much easier than that of III-V semiconductors, GeSn, and SiSn.…”
Section: Introductionmentioning
confidence: 99%