Abstract:Zinc oxide (ZnO) film deposition using a plasma-assisted mist chemical vapor deposition (CVD) with an inductively-coupled plasma source has been performed. The effects of the plasma exposure on film properties have been investigated with substrate location as a parameter. With decreasing the distance from antenna to substrate, the X-ray diffraction (XRD) results showed evident peaks of ZnO(0002), indicating that highly c-axis oriented films formed at low substrate temperature below 200°C. These results exhibit… Show more
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