“…CVD of Ru films was performed starting from Ru(Cp) 2 , Ru 3 (CO) 12 , Ru(acac) 2 , and Ru(hfb)(CO) 4 (Hacac=2,4-pentanedione; hfb = hexafluoro-2-butyne). − RuO 2 thin films have been obtained via CVD starting from Ru(acac) 3 , Ru(Cp) 2 ,, , Ru(tfa) 3 , and Ru(dpm) 3 ,, (Htfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedione and Hdpm = 2,2,6,6-tetramethyl-3,5-heptanedione). In most of the cases, the growth temperatures were higher than 350 °C, and the precursor vaporization temperatures were around 100 °C.…”