Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

Collins, Rochael J.; Shin, Hyunjung; Guire, Mark R. De; Heuer, A. H.; Sukenik, Chaim N.

doi:10.1063/1.117916

Cited by 120 publications

(89 citation statements)

References 4 publications

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“…This method was introduced by Bunker et al for the deposition of iron and calcium oxide films (9), and has been extended to form films of e.g. TiO 2 (10)(11)(12)(13)(14), ZrO 2 (13)(14)(15)(16), ZrO 2 -Y 2 O 3 (15) and Y 2 O 3 (17) on Si single crystals. The functional groups are the terminating groups of a self-assembled monolayer (SAM), i.e.…”

Section: Introductionmentioning

confidence: 99%

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

et al. 2000

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Thin ZrO2 films were produced at 323K by deposition of colloids from stable, aqueous dispersions (formed from 4mM Zr(SO4)2 in 0.4N HCl) onto silicon wafer-supported, functionalized self-assembled monolayers (SAMs). Deposition took place without visible bulk precipitation. As-deposited and heat-treated films were characterized by high-resolution transmission electron, analytical electron and scanning electron microscopy. In each case, an amorphous layer was found between the Si single crystal and the nanocrystalline ZrO2 film. The amorphous layer of the as-deposited films was found to be composed of two distinct layers: SAM and SiO2. Upon heat treatment at 773K for 2h in air or Ar, the SAM layer was no longer observed, suggesting that it decomposes and is removed completely in either atmosphere. The as-deposited films are tetragonal-ZrO2 with a grain size of ~5nm throughout the film thickness. Following heat treatment, a slight increase in grain size was observed. Deposition without the SAM was also attempted, but failed to produce a strongly adherent, uniform film.

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Section: Introductionmentioning

confidence: 99%

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

et al. 2000

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“…6). This binding energy is higher than that of Ti metal (454.0 eV), TiC (454.6 eV), TiO (455.0 eV), TiN (455.7 eV) and Ti 2 O 3 (456.7 eV), and similar to that of TiO 2 (458.4 -458.7 eV) [31,55,56]. This suggests that the titanium atoms in thin films are positively charged relative to that of titanium metal by formation of direct bonds with oxygen.…”

Section: Characterizations Of Thin Filmsmentioning

confidence: 68%

Nano/micro-patterning of anatase TiO₂thin film from an aqueous solution by site-selective elimination method

Masuda

Saito

Hoffmann

et al. 2003

Science and Technology of Advanced Materials

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We proposed a novel method to fabricate nano/micro-scaled patterns of thin films and successfully fabricated patterns of anatase TiO 2 thin films in an aqueous solution at 50 8C. The patterned self-assembled monolayer (SAM) having octadecyltrichlorosilane (OTS) regions and silanol regions was immersed in a solution containing a Ti precursor and subjected to ultrasonication for several hours. The difference in adhesion of thin films on substrates was employed for the site-selective elimination method. Heterogeneously nucleated TiO 2 and homogeneously nucleated TiO 2 particles adhering to the OTS -SAM could be easily eliminated from the substrate by ultrasonication, whereas those on silanol groups maintained their adhesion during the immersion period. TiO 2 can form chemical bonds such as Ti -O-Si with silanol groups, but cannot form them with octadecyl groups, resulting in the difference in adhesion, which is the essence of the siteselectivity of this method. The site-selective elimination method can be applied to fabricate nano/micro-scaled patterns in the solution by the immersion of the substrate that has regions on which depositions adhere strongly and regions on which depositions adhere weakly, enabling elimination by treatment such as ultrasonication. q

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“…This binding energy is higher than that of Ti metal (454.0 eV), TiC (454.6 eV), TiO (455.0 eV), TiN (455.7 eV) and Ti 2 O 3 (456.7 eV), and similar to that of TiO 2 (458.4 -458.7 eV). [50][51][52] . This suggests that the titanium atoms in thin films are positively charged relative to that of titanium metal by formation of direct bonds with oxygen.…”

Section: 4mentioning

confidence: 99%

Nanofabrication of Metal Oxide Patterns Using Self-Assembled Monolayers

Masuda¹

2011

Nanofabrication

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Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

Cited by 120 publications

References 4 publications

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

Nano/micro-patterning of anatase TiO₂thin film from an aqueous solution by site-selective elimination method

Nanofabrication of Metal Oxide Patterns Using Self-Assembled Monolayers

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Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

Cited by 120 publications

References 4 publications

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

Nano/micro-patterning of anatase TiO2thin film from an aqueous solution by site-selective elimination method

Nanofabrication of Metal Oxide Patterns Using Self-Assembled Monolayers

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Nano/micro-patterning of anatase TiO₂thin film from an aqueous solution by site-selective elimination method