2022
DOI: 10.1088/2053-1583/ac5d83
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Low pressure CVD growth of 2D PdSe2 thin film and its application in PdSe2-MoSe2 vertical heterostructure

Abstract: Palladium diselenide (PdSe2) is a novel member of the transition metal dichalcogenide (TMD) family with layer dependent bandgap in the infrared (IR) regime with potential applications in many electronic and optoelectronic devices. Low pressure CVD (LPCVD) could be an effective way to synthesize large area 2D PdSe2 materials at low growth temperatures creating new opportunities for the widescale applications of PdSe2. Here, we report LPCVD growth of PdSe2 for the first time at a growth temperature down to 250 o… Show more

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Cited by 14 publications
(12 citation statements)
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“…The thickness of the PdSe 2 flake was measured to be about 11 nm by atomic force microscopy (AFM, Figure c). The Raman spectrum of the channel shows (Figure d) four characteristic peaks at 145.3, 208.1, 223.7, and 259.8 cm –1 , corresponding to the A g 1 , A g 2 , B 1 g 2 and A g 3 Raman modes of PdSe 2 , respectively, confirming that the channel material is multilayer PdSe 2 . Ohmic-like contact is achieved as indicated from the linear output curves in Figure e. Due to the existence of charge traps arising from interface defects, intrinsic defects in 2D material, and gas molecular absorption, etc., FETs always show hysteresis in the transfer curve when dual gate voltage sweep is applied (Figure S1, Supporting Information).…”
Section: Results and Discussionmentioning
confidence: 76%
“…The thickness of the PdSe 2 flake was measured to be about 11 nm by atomic force microscopy (AFM, Figure c). The Raman spectrum of the channel shows (Figure d) four characteristic peaks at 145.3, 208.1, 223.7, and 259.8 cm –1 , corresponding to the A g 1 , A g 2 , B 1 g 2 and A g 3 Raman modes of PdSe 2 , respectively, confirming that the channel material is multilayer PdSe 2 . Ohmic-like contact is achieved as indicated from the linear output curves in Figure e. Due to the existence of charge traps arising from interface defects, intrinsic defects in 2D material, and gas molecular absorption, etc., FETs always show hysteresis in the transfer curve when dual gate voltage sweep is applied (Figure S1, Supporting Information).…”
Section: Results and Discussionmentioning
confidence: 76%
“…[15,16] Although great progress has been made in the CVD optimization of MoSe 2 flakes, it is still a great challenge to grow large-area 2D MoSe 2 with uniform selenization and good quality by CVD synthesis. [17][18][19] In the selenization reaction of 2D MoSe 2 , the gas pressure of CVD chamber acts as a crucial parameter to modulate the reaction rate and diffusion rate of MoO 3 and Se precursors. It is favorable for systematically understanding the nucleation, selenization, and growth of 2D MoSe 2 .…”
Section: Introductionmentioning
confidence: 99%
“…[ 15,16 ] Although great progress has been made in the CVD optimization of MoSe 2 flakes, it is still a great challenge to grow large‐area 2D MoSe 2 with uniform selenization and good quality by CVD synthesis. [ 17–19 ]…”
Section: Introductionmentioning
confidence: 99%
“…PdSe 2 displays a tunable band gap from near-zero at bulk to 1.3 eV in the monolayer, making it an exciting candidate for infrared optoelectronic devices. 8 Additionally, theoretical studies predict an indirect band gap of 0.45 eV for Pd 2 Se 3 . The moderate band gap, anisotropic transport properties, and wide absorption in the solar spectrum make Pd 2 Se 3 highly desirable for optoelectronic applications.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Pd 17 Se 15 has been recently used in the hydrogen evolution reaction and as counter electrodes in dye-sensitized solar cells, illustrating thermal stability and superconducting properties due to its rich metal character. PdSe 2 displays a tunable band gap from near-zero at bulk to 1.3 eV in the monolayer, making it an exciting candidate for infrared optoelectronic devices . Additionally, theoretical studies predict an indirect band gap of 0.45 eV for Pd 2 Se 3 .…”
Section: Introductionmentioning
confidence: 99%