Low-loss as-grown germanosilicate layers for optical waveguides

Ay, F.; Aydınlı, Atilla; agan, S.

doi:10.1063/1.1631753

Cited by 12 publications

(10 citation statements)

References 16 publications

(19 reference statements)

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“…[1][2][3] Silica which has 9.1 eV bandgap energy is well established as a premier candidate in optical communications. Germanium is a desirable choice as a dopant for the development of high-density optical devices and UV-sensitive material systems with low losses.…”

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confidence: 99%

Porosity Control of 20GeO[sub 2]:80SiO[sub 2] Sol-Gel Derived Thin Films for Low-Loss Optical Waveguide Devices

Rajni

Fai

Pita

et al. 2005

J. Electrochem. Soc.

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The inorganic 20GeO 2 :80SiO 2 ͑germanosilicate͒ thin films were prepared by sol-gel spin-coating and annealed at 700 and 900°C. The densification and properties of the films were studied by varying the pH levels of the starting sol ranging from 1 to 6. The uOH content in the thin films was estimated by Fourier transform infrared spectroscopy. The porosity value was derived from the index ͑n͒ of the films as determined by spectroscopic ellipsometry and was used to evaluate the densification of the material. The minimum uOH stretching band was found to occur at pH 3 for samples annealed at 700 and 900°C. For the film annealed at 900°C, the uOH stretching band disappeared and zero porosity was obtained. Atomic force microscope images show fairly smooth film surface prepared at pH 3 and annealed at 900°C. The noncrystallinity of the films was studied by means of X-ray diffraction and was confirmed by micro-Raman spectroscopy. This study leads to the development of a high-quality thin film. Iterative deposition of dense germanosilicate thin films was used to fabricate a 3 m single-mode ͑at 1.55 m wavelength͒ slab waveguide with a low propagation loss of 0.26 dB/cm. Fabrication of completely densified and optically high-quality inorganic oxide films has received much attention in the development of low-loss waveguide devices and photosensitive photonic components such as Bragg gratings and planar lightwave circuits ͑PLCs͒. [1][2][3] Silica which has 9.1 eV bandgap energy is well established as a premier candidate in optical communications. Germanium is a desirable choice as a dopant for the development of high-density optical devices and UV-sensitive material systems with low losses. 1-4 A number of methods have been developed to fabricate the homogeneous germanosilicate films, which include inductively coupled plasma enhanced chemical vapor deposition ͑IC-PECVD͒, 4 flame hydrolysis deposition ͑FHD͒, 5 and sol-gel. 6 The interests in using the sol-gel method are many-fold: homogeneity, ease of composition control, ability to fabricate large-area coatings, and low equipment cost. The sol-gel method is a solutionbased chemical process from which inorganic or inorganic-organic hybrid materials are synthesized through hydrolysis and condensation reactions. 7 The elements involved are well mixed at the molecular level, which facilitates good control of chemical compositions and provides homogenous films. 8 Characteristics and properties of sol-gel inorganic films are affected by a number of factors such as pH, nature and concentration of catalyst, water to alkoxide molar ratio ͑R͒, aging temperature, and time. These parameters control the polymerization growth and aggregations of species throughout the transition from sol to gel. The pH of the solution plays an important role in controlling the relative rate of the hydrolysis and condensation and therefore has an effect on the final structure and properties of the doped silica-based films. 9-11 It has been found that under acidic condition ͑pH Ͻ 7͒, the hydrolysis is much ...

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confidence: 99%

Porosity Control of 20GeO[sub 2]:80SiO[sub 2] Sol-Gel Derived Thin Films for Low-Loss Optical Waveguide Devices

Rajni

Fai

Pita

et al. 2005

J. Electrochem. Soc.

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“…After optimizing the material composition and poling conditions, we report a record peak d33 coefficient of -1.6 pm/V in thermally poled germanosilicate films. These films are of interest primarily for two important reasons: (1) their propagation loss can be very low, [3] which makes them excellent waveguide materials with a refractive index close to that of silica, and (2) the addition of Ge to the silica matrix increases the third-order optical susceptibility J 3) of the glass, which should result in an increase in the induced nonlinear coefficient. These properties make poled germanosilicate films a promising candidate for future low-loss integrated electro-optic devices.…”

Section: Introductionmentioning

confidence: 99%

“…Recently, we have reported the lowest propagation loss values for as-grown germanosilicate films without the need for thermal annealing. [3] In order to optimnize the poling process for this material, we grew seven individual germanosilicate films with different characteristics, as listed in Table 1. Based on our previous work, [3] the propagation losses of the as-grown waveguides were estimated to be less than 0.15 dB/cm at 1550 mn.…”

Section: Introductionmentioning

confidence: 99%

Thermally poled germanosilicate films with high second-order nonlinearity

Özcan

Digonnet

Kino

et al. 2005

(CLEO). Conference on Lasers and Electro-Optics, 2005.

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Accurate measurements of the second-order nonlinearity profile of thermally poled low-loss gernanosilicate films grown on fused-silica substrates are reported, of interest as potential electro-optic devices.After optimization, we demonstrate a record high nonlinear coefficient d33 1.6 pm/V, a two-fold improvement over highest reported d33 value in fused silica that we attribute to the presence of germanium.

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“…3 Different preparation methods have been attempted to produce high quality oxide glass thin films such as sol-gel, [8,9] plasma or laser enhanced CVD, [10,11] or sputtering. [12] However, the production of high quality HMO glass thin films is still a challenge.…”

Section: Introductionmentioning

confidence: 99%