Low frequency noise characterization and modeling of SiGe HBT featuring LASER annealing in a 55-nm CMOS node

Elbeyrouthy, J.; Vauthelin, A.; Sagnes, B.; Pascal, F.; Hoffmann, A.; Valenza, M.; Haendler, S.; Gauthier, Alexis; Chevalier, Pascal; Gloria, D.

doi:10.5075/epfl-iclab-icnf-269248

2019

DOI: 10.5075/epfl-iclab-icnf-269248

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Low frequency noise characterization and modeling of SiGe HBT featuring LASER annealing in a 55-nm CMOS node

J. Elbeyrouthy

A. Vauthelin

B. Sagnes

et al.

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Low frequency noise characterization and modeling of SiGe HBT featuring LASER annealing in a 55-nm CMOS node

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