Low‐Frequency Noise and Resistance as Reliability Indicators of Mechanically and Electrically Strained Thick‐Film Resistors

Abstract

New contemporary applications of thick resistive films are inducing the need to investigate their behaviour under various stressing conditions. On the other hand, there is a growing interest in noise measurements as means of thick-film resistor quality and reliability evaluation and evaluation of degradation under stress. For these reasons, this chapter presents effects of mechanical, electrical and simultaneous mechanical and electrical straining on performances of conventional thick-film resistors that are analysed from micro-and macro-structural, charge transport and low-frequency noise aspects.