Low-frequency dependence of plasma characteristics in dual-frequency capacitively coupled plasma sources
Yang Zhou,
Kai Zhao,
Fang-Fang Ma
et al.
Abstract:It is commonly recognized that in radio frequency capacitive discharges, a higher excitation frequency can yield an enhanced electron heating rate and ion flux. Here, we reveal the low-frequency dependence of the plasma density and ion energy/angular distribution in a low-pressure (2 Pa), dual-frequency (DF) capacitively coupled argon plasma based on a combination of experiments and kinetic particle simulations. As the low frequency (LF, fL) is decreased from 6.8 MHz to 40 kHz, the plasma density undergoes a m… Show more
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