1989
DOI: 10.1016/0168-583x(89)90984-1
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Low-energy sputtering of cobalt by cesium ions

Abstract: An experimental facility to investigate low energy (_:500 eV) sputtering of metal surfaces with ions produced by an ion gun is described. Results are reported on the sputtering yield of cobalt by cesium ions in the 100 to 500 eV energy range at a pressure of i x 10 "6Torr. The target was electroplated on a copper substrate. The sputtered atoms were collected_on a cobalt foil surrounding the target. STCo was used as a tracer to determine the sputtering yield._ _ i

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“…The ion current was measured before and after a run with a Faraday cup. A preliminary characterization of the expeirmental set-up using cesium ion beam was provided in an earlier paper [10].…”
Section: Sputtering Yield Of Chromium By Argon and Xenon Ions With Enmentioning
confidence: 99%
“…The ion current was measured before and after a run with a Faraday cup. A preliminary characterization of the expeirmental set-up using cesium ion beam was provided in an earlier paper [10].…”
Section: Sputtering Yield Of Chromium By Argon and Xenon Ions With Enmentioning
confidence: 99%