Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication

Abstract

We present low energy ion beam mixing as a tool for the fabrication of composite layers with smooth interfaces. Using this tool we make a stack of alternating layers of Si and MoxSiy. We measure composition and interfacial roughness (σ) and find x/y≊5/3 and σ≊4 Å. The method can be applied to reduce absorption losses in x-ray multilayer mirrors for high-resolution dispersive purposes, and to increase thermal stability of multilayers. The thickness of the mixed layers is found to be equal to the ion range.