2014
DOI: 10.1016/j.apsusc.2014.07.016
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Low energy Cu clusters slow deposition on a Fe (001) surface investigated by molecular dynamics simulation

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Cited by 11 publications
(4 citation statements)
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“…The problem of cluster interactions with the surface of a substrate has been widely discussed in many studies [27][28][29][30]. According to them, the nature of these phenomena depends on the kinetic energy of incident clusters, type and temperature of substrate, cluster size and also the direction of the beam relative to the substrate surface, etc.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The problem of cluster interactions with the surface of a substrate has been widely discussed in many studies [27][28][29][30]. According to them, the nature of these phenomena depends on the kinetic energy of incident clusters, type and temperature of substrate, cluster size and also the direction of the beam relative to the substrate surface, etc.…”
Section: Resultsmentioning
confidence: 99%
“…According to them, the nature of these phenomena depends on the kinetic energy of incident clusters, type and temperature of substrate, cluster size and also the direction of the beam relative to the substrate surface, etc. All these factors affect the rearrangement and diffusion which may occur on substrate surface [27,28]. The phases present in the coating material were supersaturated solid solutions of bcc and fcc structure, depending on Cu content.…”
Section: Resultsmentioning
confidence: 99%
“…The current atomic-level experimental techniques, such as low energy electron diffraction and scanning tunneling microscopy, have allowed the direct visualization of atomic structures of surfaces, but they cannot resolve the kinetic process of atoms at picosecond scale [8,9]; therefore, atomistic simulation has become a valuable complementary method for the study of film growth at atomic scale. Films could grow by atomic units [10] or nanometer-sized clusters [11] during the PVD, which therefore is generally simplified as an atomic deposition process [12] or an atomic cluster deposition process [13]. PVD processes have been modeled via classical molecular dynamics (CMD)simulations based on these two models [12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…Films could grow by atomic units [10] or nanometer-sized clusters [11] during the PVD, which therefore is generally simplified as an atomic deposition process [12] or an atomic cluster deposition process [13]. PVD processes have been modeled via classical molecular dynamics (CMD)simulations based on these two models [12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%