2016
DOI: 10.1016/j.jnucmat.2015.12.017
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Low energy and low fluence helium implantations in tungsten: Molecular dynamics simulations and experiments

Abstract: 300 eV Helium implantation process into tungsten at 300 K has been studied with molecular dynamic simulations (MD). Predicted retention doses were compared to that obtained from experiments performed in equivalent conditions. A saturation phenomenon of the helium retention was evidenced for a number of impinging He atoms and a retention dose similar in both, experiments and simulations. From MD simulations it is learnt that observed Helium diffusion, formation and coalescence of clusters are the phenomena lead… Show more

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Cited by 56 publications
(37 citation statements)
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“…a linear rise on a log-log scale followed by a saturation step, has already been reported by several authors [48][49][50]. In a previous work this experimental behavior has been compared to molecular dynamics simulation (MDs) of the implantation process, and a very good agreement was found [51]. The very low retention rate of He in W (about 10% in the linear part of the curve) can be related to its very high mobility inside the lattice when not trapped into defects like vacancies.…”
Section: Preliminary Results Of He Implantation In Tungstensupporting
confidence: 71%
“…a linear rise on a log-log scale followed by a saturation step, has already been reported by several authors [48][49][50]. In a previous work this experimental behavior has been compared to molecular dynamics simulation (MDs) of the implantation process, and a very good agreement was found [51]. The very low retention rate of He in W (about 10% in the linear part of the curve) can be related to its very high mobility inside the lattice when not trapped into defects like vacancies.…”
Section: Preliminary Results Of He Implantation In Tungstensupporting
confidence: 71%
“…Complete description of the model and of the data treatment could be found in reference [13], we only give here the most important points of the simulation.…”
Section: Molecular Dynamic Simulation Modelmentioning
confidence: 99%
“…Such as described in the previous paragraphs and in our previous work, the course of a typical implantation run has been followed for 300 eV He atom kinetic energy and a W substrate temperature of 300 K by MD simulations [13]. Three steps have been evidenced when the number of implanted He atoms increases inside the W lattice:…”
Section: Characteristics Of He Implantation In W At Kinetic Energy Ofmentioning
confidence: 99%
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