“…There are numerous deposition techniques used to grow dielectric oxide thin lms including molecular beam epitaxy (MBE), 1,18 sol-gel processing, 2,3,11,19 magnetron sputtering, 5,8 metal-organic chemical vapor deposition (MOCVD), 20 chemical solution deposition (CSD) 21,22 and pulsed laser deposition (PLD). 10,23 Among these fabrication methods, magnetron sputtering is considered to be the most favorable deposition method to obtain highly uniform lms even on polycrystalline substrates at high deposition rates.…”