1999
DOI: 10.2494/photopolymer.12.189
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Low Dielectric Constant Materials

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Cited by 5 publications
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“…27 However, the higher thermal and mechanical stabilities are demanded for high temperature-resistant insulating materials in semiconductor devices and other applications. [28][29][30] We tried to another approach to synthesize polysilarylenesiloxane with a high T g , that is, introducing a tetraphenyldisiloxane unit instead of a tetramethyldisiloxane unit. PDMS and polydiphenylsiloxane (PDPS) show À123 C of a T g and 265 C of a T m , respectively, according to the literature.…”
mentioning
confidence: 99%
“…27 However, the higher thermal and mechanical stabilities are demanded for high temperature-resistant insulating materials in semiconductor devices and other applications. [28][29][30] We tried to another approach to synthesize polysilarylenesiloxane with a high T g , that is, introducing a tetraphenyldisiloxane unit instead of a tetramethyldisiloxane unit. PDMS and polydiphenylsiloxane (PDPS) show À123 C of a T g and 265 C of a T m , respectively, according to the literature.…”
mentioning
confidence: 99%