Low chromatic Fresnel lens for broadband attosecond XUV pulse applications

Pan, Huaihai; Scheffold, Christian; Guggenmos, Alexander; Chew, Soo Hoon; Schmidt, Jürgen; Zhao, Qian; Kleineberg, Ulf

doi:10.1364/oe.24.016788

Cited by 4 publications

(4 citation statements)

References 30 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…An FZP is a key optical element for focusing of high harmonics on the sub-μm scale. An offaxis short focal length zone plate can be integrated into an EUV mask scanning microscope equipped with an HHG source [40][41][42]. A lower divergence beam is required to increase the coupling efficiency between an EUV light and an FZP.…”

Section: Advanced Hhg-csm Systemmentioning

confidence: 99%

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Nagata

Harada

Watanabe

et al. 2019

Int. J. Extrem. Manuf.

View full text Add to dashboard Cite

In this review, we describe our research on the development of the 13.5 nm coherent microscope using high-order harmonics for the mask inspection of extreme ultraviolet (EUV) lithography. EUV lithography is a game-changing piece of technology for high-volume manufacturing of commercial semiconductors. Many top manufacturers apply EUV technology for fabricating the most critical layers of 7 nm chips. Fabrication and inspection of defect-free masks, however, still remain critical issues in EUV technology. Thus, in our pursuit for a resolution, we have developed the coherent EUV scatterometry microscope (CSM) system with a synchrotron radiation (SR) source to establish the actinic metrology, along with inspection algorithms. The intensity and phase images of patterned EUV masks were reconstructed from diffraction patterns using ptychography algorithms. To expedite the practical application of the CSM, we have also developed a standalone CSM, based on high-order harmonic generation, as an alternative to the SR-CSM. Since the application of a coherent 13.5 nm harmonic enabled the production of a high contrast diffraction pattern, diffraction patterns of sub-100 ns size defects in a 2D periodic pattern mask could be observed. Reconstruction of intensity and phase images from diffraction patterns were also performed for a periodic line-and-space structure, an aperiodic angle edge structure, as well as a cross pattern in an EUV mask.

show abstract

Section: Advanced Hhg-csm Systemmentioning

confidence: 99%

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Nagata

Harada

Watanabe

et al. 2019

Int. J. Extrem. Manuf.

View full text Add to dashboard Cite

show abstract

“…Focusing of shorter XUV pulses may be achieved by combining a refractive lens with another focusing element. For example, the development of a multicomponent lens consisting of an XUV refractive lens and a Fresnel zone plate was suggested [28,29]. It was theoretically shown that these multi-component lenses can be used to focus broadband attosecond pulses to nanometer spot sizes [29], which may enable the investigation of electronic processes with attosecond temporal and nanometer spatial resolution.…”

Section: Xuv Refractive Lensmentioning

confidence: 99%

“…The lack of refractive elements in the XUV spectral region can be explained by the large absorption of radiation in the XUV domain by commonly used materials. The use of specially designed microscopic refractive lenses has been proposed [28,29]. However, the need to use very thin lenses with a sophisticated design makes a practical implementation extremely challenging, and no demonstrations exist to date.…”

Section: Introductionmentioning

confidence: 99%

Extreme-ultraviolet refractive optics

Drescher¹,

Kornilov²,

Witting³

et al. 2018

Nature

View full text Add to dashboard Cite

Refraction is a well-known optical phenomenon that alters the direction of light waves propagating through matter. Microscopes, lenses and prisms based on refraction are indispensable tools for controlling the properties of light beams at visible, infrared, ultraviolet and X-ray wavelengths. The large absorption of extreme-ultraviolet (XUV) radiation in matter, however, hinders the development of refractive lenses and prisms in this spectral region. Here, we demonstrate control over the refraction of XUV radiation by using a gas jet with a density gradient across the XUV beam profile. A gas phase prism is demonstrated that leads to a frequency-dependent deflection of the XUV beam. The strong deflection in the vicinity of atomic resonances is further used to develop a deformable XUV refractive lens, with low absorption and a focal length that can be tuned by varying the gas pressure. Our results provide novel opportunities in XUV science and open a route towards the transfer of refraction-based techniques including microscopy and nanofocusing, which are well established in other spectral regions, to the XUV domain.

show abstract

“…The manipulation of XUV radiation is hindered by the complexity and inefficiency of available optics [13]. The limited efficiencies [14] of these narrowband optics have led to the use of hybrid lenses that combine diffraction and refraction [15,16], although their construction remains highly complex and expensive [17].…”

Section: Introductionmentioning

confidence: 99%

Optimised XUV holography using spatially shaped high harmonic beams

Treacher¹,

Lloyd²,

Wiegandt³

et al. 2019

Opt. Express

View full text Add to dashboard Cite

We present a novel method for controlling the transverse positions and relative powers of multiple high-order harmonic beams. A phase-only spatial light modulator is used to produce multiple infrared foci, the positions and intensities of which can be controlled programmably, enabling the generation and control of multiple HHG beams. To demonstrate the utility of this method we perform Fourier transform holography with separate illumination of the object and reference pinhole by a pair of HHG beams, which makes optimal use of the available photon flux. The programmable control of the spatial distribution of HHG beams demonstrated here offers new opportunities for experiments at extreme ultraviolet (XUV) wavelengths, particularly for photon intensive applications such as imaging.

show abstract

Low chromatic Fresnel lens for broadband attosecond XUV pulse applications

Cited by 4 publications

References 30 publications

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection

Extreme-ultraviolet refractive optics

Optimised XUV holography using spatially shaped high harmonic beams

Contact Info

Product

Resources

About