Integrated Photonics Research 1996
DOI: 10.1364/ipr.1996.imc6
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Loss reduction for phased-array demultiplexers using a double etch technique

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Cited by 11 publications
(5 citation statements)
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“…A disadvantage of the latter approach is that lowering the confinement increases the minimal bending radius and, consequently, increases the device size. Low confinement can be combined with small bending radii by applying a local contrast reduction near the array apertures using a double-etch process [23].…”
Section: E Design For Low Lossmentioning
confidence: 99%
“…A disadvantage of the latter approach is that lowering the confinement increases the minimal bending radius and, consequently, increases the device size. Low confinement can be combined with small bending radii by applying a local contrast reduction near the array apertures using a double-etch process [23].…”
Section: E Design For Low Lossmentioning
confidence: 99%
“…Without considering the absorption loss of the material, there is a large mode mismatch between the deeply etched waveguide and the slab region, resulting in a large coupling loss. Therefore, a section of shallow etched transition waveguide is introduced at the junction of the deeply etched waveguide and the slab region to reduce the mode mismatch, that is double-etched process [9], [21]. Meanwhile, a linear taper is used to further reduce the coupling loss, as depicted in the Fig.…”
Section: Design and Fabricationmentioning
confidence: 99%
“…Therefore the excess loss is high by increasing the branch number. To solve this problem, the double etch technique and the vertically tapered waveguide using additional processing steps have been reported [2,3]. On the other hand, a method using intersectional paths at the Y-branch circuit has also been reported [4].…”
Section: -2 1x64splittermentioning
confidence: 99%