2007
DOI: 10.1116/1.2743648
|View full text |Cite
|
Sign up to set email alerts
|

Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach

Abstract: Articles you may be interested inTime dependent changes in extreme ultraviolet reflectivity of Ru mirrors from electron-induced surface chemistry Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
39
0

Year Published

2009
2009
2017
2017

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 35 publications
(40 citation statements)
references
References 87 publications
1
39
0
Order By: Relevance
“…In an oxygen containing ambient, a RuO 2 (1 1 0) surface is terminated by rows of differently coordinated O atoms in the [0 0 1] direction [26][27][28]; see When oxygen is absent in the gas phase, i.e. in UHV, the O ot atoms will desorb from the RuO 2 (1 1 0) surface in the temperature range of 100-200°C with a second order kinetics [29].…”
Section: Oxidation Of the Ru(0 0 0 1) Surfacementioning
confidence: 99%
See 2 more Smart Citations
“…In an oxygen containing ambient, a RuO 2 (1 1 0) surface is terminated by rows of differently coordinated O atoms in the [0 0 1] direction [26][27][28]; see When oxygen is absent in the gas phase, i.e. in UHV, the O ot atoms will desorb from the RuO 2 (1 1 0) surface in the temperature range of 100-200°C with a second order kinetics [29].…”
Section: Oxidation Of the Ru(0 0 0 1) Surfacementioning
confidence: 99%
“…O/m 2 and that the thickness of a monolayer (i.e., the distance between two (1 1 0) planes) equals 0.317 nm (as determined by using lattice constants from Ref. [26,27]). Hence: where C is a constant (6.36 Â 10 19 m À2 nm À1 ) and J H is 2 Â 10 19 at.…”
Section: Kinetics Of Ruo 2 Reductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The EUV exposure system includes several (typically 6 or 8) Mo/Si multilayer mirrors [20], each of which has high reflectivity not only for in-band light but also for OOB light, at wavelengths longer than 130 nm. Such OOB radiation can range across the spectrum from vacuum ultraviolet (VUV) to infrared (IR) [1], seriously degrading EUVL performance.…”
Section: Suppression Of Out-of-band Radiation With the Minimum Mass Tmentioning
confidence: 99%
“…233 Thus, the formation of a surface RuO2 nuclei, catalyze the O2 dissociation, selfaccelerating the oxide growth process. 234 This results in a self-limited growth of ~1.6 nm-thick RuO2(110) layer on Ru(001) surface over a large temperature, and O2 pressure range from ~280 to ~380°C, and 10 -4 to 10 mbar, respectively. 230 However, since this autocatalytic oxidation process for Ru and, other metals such as Pb, 235 in general, occurs at enhanced temperatures, where the kinetic barriers for oxide formation ("nucleation") are overcome, thermodynamics become more relevant.…”
Section: Introductionmentioning
confidence: 99%