Long-term stability of low-temperature deposited Cat-CVD SiN
x
thin film against damp-heat stress
Huynh Thi Cam Tu,
Keisuke Ohdaira
Abstract:In this paper, we systematically investigated the damp heat (DH) stability of silicon nitride (SiN
x
) films formed by catalytic chemical vapor deposition (Cat-CVD) at low substrate temperatures (T
sub) of 100–137 °C, aiming at application as a gas barrier and anti-reflection layer of perovskite/silicon tandem solar cells. We have found that the optical properties of the SiN
x
films such as refractive index and ref… Show more
Set email alert for when this publication receives citations?
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.