Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al2O3

Mareš, Pavel; Kadlec, S.; Dubau, Martin; Marek, A.; Vyskočil, Jiří

doi:10.1016/j.vacuum.2019.109161

Cited by 9 publications

(2 citation statements)

References 33 publications

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“…the deposition rate) between 1 sccm and 1.5 sccm (Fig. 1c) indicates that the target surface has become oxidized and is no longer purely metallic; this transition from the "metal mode" to the "compound mode" is characterized as target poisoning effect [31], [32], [35] which has to be managed in case of the deposition of oxide films by magnetron sputtering methods. Consequently, at a low oxygen flow rate, the deposited film is mainly metallic with a high deposition rate (i.e.…”

Section: Phase Evolution Of the Sputtered Mn-fe Filmmentioning

confidence: 99%

Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor

Jolayemi

Buvat

Brousse

et al. 2022

J. Electrochem. Soc.

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The scaling up of wireless operating microelectronics for upcoming Internet of Things (IoT) applications demands high-performance micro-supercapacitors (MSCs) with corresponding high-energy and power capabilities. Indeed, this necessitates the quest for MSC’s electrode materials capable of delivering high energy density at high charge/discharge rates. Many multicationic oxides, such as spinel manganese-iron compounds, demonstrate good pseudocapacitive properties as positive electrodes in conventional supercapacitors. However, fulfilling the required fabrication techniques is a challenge for their applications in MSCs. Hence, this study, for the first time, demonstrates the successful deposition of spinel Mn-Fe thin films on a functional platinum-based current collector. The deposition is achieved in a reactive oxygen environment via reactive DC magnetron sputtering techniques and subsequently annealed ex-situ at 600°C in a nitrogen environment. The electrochemical signature in neutral 1 M Na2SO4 aqueous electrolyte is comparable to those reported for spinel type Mn-Fe bulk counterparts. The areal capacitance at 10.0 mV.s-1 is 15.5 mF.cm-2 for 1 µm thick film, exhibiting excellent coulombic efficiency (close to 100%) and long-term cycle stability after 10,000 cycles. Thus, the synthesis of the multicationic pseudocapacitive oxides via compatible microelectronic deposition methods has set a prospective path to achieve very high-performance MSCs for future IoT applications.

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Section: Phase Evolution Of the Sputtered Mn-fe Filmmentioning

confidence: 99%

Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor

Jolayemi

Buvat

Brousse

et al. 2022

J. Electrochem. Soc.

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“…On the other hand, the coating process is hard to control in order to achieve high reproducibility and the achieved dielectric strength is far from the ideal values measured for bulk Al2O3. Tantalum oxide (Ta2O5) coatings could be a valuable alternative since they have better dielectric properties and the reactive process is easier to control, but they are also more expensive [3,4]. This work aims to improve the dielectric properties of surface oxide layers and, at the same time, to maintain a reasonable production cost.…”

Section: Introductionmentioning

confidence: 99%

Al2O3-Ta2O5 multilayer thin films deposited by pulsed direct current magnetron sputtering for dielectric applications

Drevet

Souček

Mareš

et al. 2021

NANOCON 2021 Conference Proeedings

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This research aims at synthesizing multilayer oxide thin films made of Al2O3 and Ta2O5 for dielectric applications. Multilayer thin films made of two, four, or eight oxide layers are synthesized by physical vapor deposition, specifically the mid-frequency pulsed direct current magnetron sputtering. The thin films are made of stoichiometric Al2O3 and Ta2O5 layers having a specific morphology observed from cross-section images obtained by scanning electron microscopy (SEM). The Al2O3 layers have a columnar structure, whereas the Ta2O5 layers are uniformly dense. X-ray diffraction (XRD) characterizations show that these oxide layers have very limited crystallinity due to the experimental conditions used during the magnetron sputtering process, particularly the low temperature of the substrate.The dielectric behavior of the multilayer oxide thin films is assessed by measuring their dielectric breakdown potential. The two-layer and four-layer systems have intermediate values compared to the dielectric breakdown potentials measured for a monolayer of Al2O3 and a monolayer of Ta2O5 produced under the same experimental conditions. In the case of the eight-layer system, the dielectric breakdown potential value is the highest one, even higher than that measured for a monolayer of Ta2O5.

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A review on the application of magnetron sputtering technologies for solid oxide fuel cell in reduction of the operating temperature

Pan,

Wang,

et al. 2024

International Journal of Hydrogen Energy

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Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al2O3

Cited by 9 publications

References 33 publications

Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor

Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor

Al2O3-Ta2O5 multilayer thin films deposited by pulsed direct current magnetron sputtering for dielectric applications

A review on the application of magnetron sputtering technologies for solid oxide fuel cell in reduction of the operating temperature

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Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al2O3

Cited by 9 publications

References 33 publications

Sputtered (Fe,Mn)3O4 Spinel Oxide Thin Films for Micro-Supercapacitor

Sputtered (Fe,Mn)3O4 Spinel Oxide Thin Films for Micro-Supercapacitor

Al2O3-Ta2O5 multilayer thin films deposited by pulsed direct current magnetron sputtering for dielectric applications

A review on the application of magnetron sputtering technologies for solid oxide fuel cell in reduction of the operating temperature

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Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor

Sputtered (Fe,Mn)₃O₄ Spinel Oxide Thin Films for Micro-Supercapacitor