A solid-state
hybrid photonic–plasmonic (HPP) waveguide
geometry has been experimentally demonstrated with plasmonic titanium
nitride. The configuration is made with robust fabrication techniques,
CMOS-compatible materials, and features a straightforward design with
dielectric cladding layers that exhibit a significant index mismatch
with the substrate. The resulting waveguide is shown to reduce both
the propagation loss (0.6 dB/mm) and mode size (7.7 μm) when
compared to previously reported long-range surface plasmon
polariton (LRSPP) waveguides using both noble metal and alternative
metals of similar configurations. In addition, the structure removes
the need to match the cladding indices with the substrate index, allowing for a thin film superstrate cladding (∼300 nm) that can be readily deposited using numerous methods. This flexibility allows for additional optimization
factors to be considered in the design, such as metal film epitaxy,
etching selectivity, device function, and compatibility with subsequent
fabrication steps. For example, the top cladding layer can be made
of silicon nitride for photonic circuits, a gain medium for loss compensation,
as well as lithium niobate or zinc oxide for electrical or optical
modulation, without sacrificing performance.