1997
DOI: 10.1109/96.641504
|View full text |Cite
|
Sign up to set email alerts
|

Long lossy lines (L/sup 3/) and their impact upon large chip performance

Abstract: The semiconductor industry expects the performance of microprocessors to continue at its current rate of improvement; i.e., clock rates should double every two to three years. This is a commendable goal but it is also fair to question whether this is an achievable goal. The fundamental problem is that as groundrules are reduced, the natural tendency is to make smaller conductor cross-sectional areas. The result is a high resistance line that exhibits slow wave propagation effects [1]. This reduces the general … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
14
0

Year Published

1998
1998
2013
2013

Publication Types

Select...
6
2
1

Relationship

0
9

Authors

Journals

citations
Cited by 35 publications
(14 citation statements)
references
References 9 publications
0
14
0
Order By: Relevance
“…If there are k repeaters the rcl 2 delay is replaced by k(rc(l/k) 2 ) (Davidson et al 1997). Ten repeaters could reduce wire delays by a factor of 10, although some time would be added by delays in the repeater circuits.…”
Section: Long Wire Delaysmentioning
confidence: 99%
“…If there are k repeaters the rcl 2 delay is replaced by k(rc(l/k) 2 ) (Davidson et al 1997). Ten repeaters could reduce wire delays by a factor of 10, although some time would be added by delays in the repeater circuits.…”
Section: Long Wire Delaysmentioning
confidence: 99%
“…Moreover, because of the higher operational frequencies and lower resistivity copper interconnects, inductive impedance of the on-chip wires become comparable to or larger than the resistive impedance. Due to these reasons, on chip capacitive and inductive effects have enormous effects on the signal integrity and performance of today's copper (Cu) based nano-interconnects [1], [2]. Again, the resistivity of copper increases in the nanometric regime due to surface and grain boundary scattering [3], which deteriorates the performance of especially long intermediate and global interconnects.…”
Section: Introductionmentioning
confidence: 99%
“…As a result, interconnect delay in long global wires is an increasing problem in integrated circuits (IC) relative to delays in transistor switching [1], [2]. In the latest microelectronics technology nodes, interconnect delay has become the limiting factor in determining the speed of digital systems [3].…”
Section: Introductionmentioning
confidence: 99%