2016
DOI: 10.1002/cphc.201501013
|View full text |Cite
|
Sign up to set email alerts
|

Localized Plasmon‐Stimulated Nanochemistry of Graphene Oxide on a SERS Substrate

Abstract: In recent years, there has been remarkable progress in the reduction and functionalization of graphene oxide (GO) using nanoparticles and high-energy optical photons. Most of these reactions are carried out in solutions, whereas the local modification of GO on solid substrates still remains a challenge. In this work, we demonstrate the local reduction of GO and its further destruction, leading to the synthesis of polyaromatic hydrocarbons (PAHs) stimulated by localized surface plasmons (LSPs). The reduction of… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 34 publications
0
1
0
Order By: Relevance
“…Unlike #0, this cluster contains a series of investigations on the SERS properties of graphene itself. For example, Ramanauskaite et al [163] in-vestigated the reduction process GO undergoes when used in SERS substrates and the changes in its properties. Li et al [157] investigated that wrapping silicon nanowires with graphene allows silicon nanowires, which otherwise have no SERS properties, to become a novel SERS substrate.…”
Section: Keyword Analysis and Evolution Of The Fieldmentioning
confidence: 99%
“…Unlike #0, this cluster contains a series of investigations on the SERS properties of graphene itself. For example, Ramanauskaite et al [163] in-vestigated the reduction process GO undergoes when used in SERS substrates and the changes in its properties. Li et al [157] investigated that wrapping silicon nanowires with graphene allows silicon nanowires, which otherwise have no SERS properties, to become a novel SERS substrate.…”
Section: Keyword Analysis and Evolution Of The Fieldmentioning
confidence: 99%