Localized Helium Implantation in SiCf/SiCm Composites Comparing Fiber and Matrix Swelling

Ambat, M. V.; Frazer, D.; Popović, Maša; Balooch, M.; Stevenson, S.; Scott, Analee; Kabel, Joey; Hosemann, Peter

doi:10.1007/s11837-019-03869-y

Cited by 4 publications

(1 citation statement)

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“…The dose levels vary slightly between the different irradiated regions. After irradiation the samples were investigated using Atomic Force Microscopy (DI IIIA) to quantify the height change due to Helium implantation as a function of dose as described in [32]. Data analysis was performed using Gwyddion software.…”

Section: Methodsmentioning

confidence: 99%

Quantifying residual stress in Helium-implanted surfaces and its implication for blistering

Hosemann

Sebastiani

Mughal

et al. 2021

Journal of Materials Research

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Helium implantation in surfaces is of interest for plasma facing materials and other nuclear applications. Vanadium as both a representative bcc material and a material relevant for fusion applications is implanted using a Helium ion beam microscope, and the resulting swelling and nanomechanical properties are quantified. These values are put in correlation to data obtained from micro residual stress measurements using a focused ion beam based ring-core technique. We found that the swelling measured is similar to literature values. Further we are able to measure the surface stress caused by the implantation and find it approaches the yield strength of the material at blistering doses.The simple calculations performed in the present work, along with several geometrical considerations deduced from experimental results confirm the driving force for blister formation comes from bulging resulting mainly from gas pressure buildup, rather than solely stress induced buckling.

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Section: Methodsmentioning

confidence: 99%