Localized heating induced chemical vapor deposition for one-dimensional nanostructure synthesis

Abstract

Localized heating has emerged as a viable technique for the site specific synthesis of one-dimensional ͑1D͒ nanostructures. By localizing the heat source, the extent of chemical vapor deposition synthesis reactions can be confined to well-defined, microscale regions. Resistive heating has been extensively used to realize highly localized regions of elevated temperature while maintaining a microelectronics-compatible thermal environment elsewhere. Other localized heating methods are being pursued as well. Overall, the approach is simple, flexible, and robust, and offers unique opportunities in 1D nanostructure synthesis, characterization, and integration. Herein, the recent progress of these techniques is reviewed and discussed.

Heteroepitaxial Growth of GaN on Unconventional Templates and Layer‐Transfer Techniques for Large‐Area, Flexible/Stretchable Light‐Emitting Diodes

“…[79][80][81][82][83][84][85][86] We have also demonstrated that an array of metallic microbridges such as molybdenum on ordinary glass substrates can be selectively heated up to 1200 °C while maintaining the substrate temperature below 100 °C (Figure 7 b), and have used the bridges for the synthesis of various materials, including polycrystalline silicon (p-Si) [ 87 ] and SWCNTs, [ 88 ] as well as for the annealing of lanthanum hexaboride (LaB 6 ) [ 89 ] and EL patterning. [ 90 ] We also successfully synthesized ZnO nanorods and ZnO/GaN coreshell nanorod heterostructures (Figure 7 c).…”

“…[ 79,80 ] When the synthesized material is larger than the microbridges, precise control of the synthesis temperature becomes challenging due to the signifi cant heat capacity. With local synthesis of p-Si using silane (SiH 4 ), it was found that variations in the synthesis temperature did not signifi cantly degrade the quality of the p-Si layer, and that growth occurred in a concentric mode [ 87 ] around the microheater (Figure 7 f), which chould be due to the uniform decomposition of SiH 4 around the microheater.…”

Localized Synthesis of Carbon Nanotube Films on Suspended Microstructures by Laser-Assisted Chemical Vapor Deposition

“…The key technology is to keep the heat localized enough for CNT growth, so that other areas remain low temperatures to avoid damage to CMOS devices [18]. Lin's group for the first time realized CNT synthesis on a suspended microstructure using resistive [19] and inductive local heating [20].…”

Localized aerosol-assisted CVD of nanomaterials for the fabrication of monolithic gas sensor microarrays

“…Recently, localized heating for CVD synthesis has emerged as a viable technique to confine the required thermal environment for both the decomposition of the vapor-phase reactants and the growth kinetics of NSs to a microscale area [7], with the promise to reduce significantly the power consumption of high temperature 'hot-wall' reactors (as microheaters offer faster temperature response with low power consumption) and the processing time (as the integration of nanostructures via localized heating avoid the use of masks or other intermediate thermal process steps for their integration), which may reduce the costs of the process. The use of localized heating for CVD is expected to increase deposition efficiency and reduce contamination avoiding deposition of precursors on the reaction chamber walls.…”

“…The use of localized heating for CVD is expected to increase deposition efficiency and reduce contamination avoiding deposition of precursors on the reaction chamber walls. CVD via localized heating has been mainly used for CNT synthesis [7], and although some attempts have also been reported for the synthesis of other materials, e.g. MOX-NSs [8], the impact of a non-isothermal environment in the properties of materials remains largely unexplored, and some drawbacks of traditional CVD, such as the high onset temperatures (up to 1000 • C or more) for formation of nanostructures, the need of volatile precursors and the requirement of vacuum environment, are still present [9].…”