Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets

Ichikı, Takanori; Taura, Ryo; Horiike, Yasuhiro

doi:10.1063/1.1630375

Cited by 144 publications

(88 citation statements)

References 18 publications

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“…It is clear that the linearfield jet has significantly stronger emission atomic O lines at 631.0, 777.4, and 844.6 nm, O 2 + line at 533.2 nm, and OH line at 309.6 nm, which are known enablers for polymeric surface modification. 4,13,14 In particular, the intensity of the excited O atom line at 777.4 nm in the linear-field jet is 6.1-fold of that in the cross-field jet, similar to the 5.9-fold in wavelength-integrated intensity. Also notable from Fig.…”

mentioning

confidence: 55%

Contrasting characteristics of linear-field and cross-field atmospheric plasma jets

Walsh

Kong

2008

Applied Physics Letters

249

147

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This letter reports an experimental study of two types of atmospheric pressure plasma jets in terms of their fundamental properties and their efficiency in etching polymeric materials. The first plasma jet has a cross-field configuration with its electric field perpendicular to its gas flow field, whereas the second is a linear-field device having parallel electric and flow fields. The linear-field jet is shown to drive electron transportation to the downstream application region, thus facilitating more active plasma chemistry there. This is responsible for its etching rate of polyamide films being 13-fold that of its cross-field counterpart.

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mentioning

confidence: 55%

Contrasting characteristics of linear-field and cross-field atmospheric plasma jets

Walsh

Kong

2008

Applied Physics Letters

249

147

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“…Several results on the high-speed, direct etching of Si up to hundreds of micrometers per minute have been reported [13,45,46]. A three-dimensional process has also been reported, in which a VHF microplasma jet is mounted on a machine tool with three movable axes [47].…”

Section: Applications In Materials Processingmentioning

confidence: 99%

Current status of microplasma research

Tachibana

2006

IEEJ Transactions Elec Engng

151

111

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Microscale plasmas of micrometer to millimeter range have been attracting much attention in recent years. Those microplasmas generally operate at high-pressure regions, including atmospheric pressure, and exhibit characteristics that differ from traditional plasmas at lower pressure regions in their plasma parameters and other parameters originating from their small dimensions. When those characteristics are well combined with the inherent properties of plasmas as reactive, light-emissive and conductive/dielectric media, there appear a variety of potential applications for nano-material syntheses, micromachining tools, microchemical analyses, photonic devices and biomaterial processing. In this article, the current status and perspective of microplasma research are reviewed from the viewpoints of plasma generation, diagnostics/simulations and new applications.

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“…They are being investigated for possible use as, for example, excimer lighting sources [6], hydrogen production [7,8] and diamond deposition [9]. Radio frequency (rf) excited MDs are also being studied for use in lighting and surface modification [10][11][12]. For example, Eden et al [13] demonstrated MD sources operating at 5-20 kHz using rare gas and Ar/N 2 mixtures in large-arrays of up to 40 000 pixels.…”

Section: Introductionmentioning

confidence: 99%

Microdischarges for use as microthrusters: modelling and scaling

Arakoni¹,

Ewing²,

Kushner³

2008

J. Phys. D: Appl. Phys.

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Microsatellites with masses of tens of kilograms require only hundreds of micronewtons of thrust for station keeping and attitude control. Microdischarges (MDs) offer a compact way of generating such thrusts without using complex propulsion systems. In this paper, results from computational investigations of MDs sustained in Ar with tens of Torr back pressure are discussed with emphasis on conversion of discharge power into gas heating which can then be expanded in a nozzle to generate thrust. Typical cylindrical geometries have diameters of a few hundred micrometres and lengths of a few millimetres. We found that the gas temperature can exceed 1000 K for power densities of tens of kilowatts per cubic centimetre at back (upstream) pressures of tens of Torr. The nozzle length and location of the discharge in the MD channel are important from a gas dynamics viewpoint and so influence the incremental thrust (above that of the cold flow). Confining the discharge in the nozzle typically increases the peak gas temperature and the flow velocity, thereby potentially improving the performance of a MD used as a microthruster.

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Localized and ultrahigh-rate etching of silicon wafers using atmospheric-pressure microplasma jets

Cited by 144 publications

References 18 publications

Contrasting characteristics of linear-field and cross-field atmospheric plasma jets

Contrasting characteristics of linear-field and cross-field atmospheric plasma jets

Current status of microplasma research

Microdischarges for use as microthrusters: modelling and scaling

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