Local electron beam induced reduction and crystallization of amorphous titania films

Kern, P.; Jäggi, Christian J.; Utke, Ivo; Friedli, Vinzenz; Michler, Johann

doi:10.1063/1.2219398

Cited by 31 publications

(37 citation statements)

References 28 publications

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“…35 Under exposure condition N°2, the global substrate heating during 5 s is considered negligible, while the estimated temperature rise of about 130°C in the beam center according to eq 2 is far below the crystallization temperature of 440°C for electrolytically deposited TiO 2 films. 36 This decrease in crystallization temperature is even more pronounced than previously reported for irradiation under SEM conditions at 2 Acm -2 during 600 s with additional substrate preheating at 250°C, 34 reaching an estimated temperature of about 270°C in the beam center. It was shown that the crystallization was limited to the irradiated zone even after long and intense exposure.…”

Section: Localized Reduction and Crystallizationmentioning

confidence: 48%

“…Previous irradiations with Gaussian SEM probe intensities have led to Gaussian profiles within the oxide. 34 The shape and lateral uniformity of the irradiated spots in Figure 4 do not indicate a major contribution of backscattered electrons to oxygen loss. The lateral extension of the symmetric volume losses in Figures 3 and 4 was considered as approximate e-beam probe size to calculate exposure current densities in Table 1.…”

Section: Localized Reduction and Crystallizationmentioning

confidence: 95%

“…The global sample temperature T S increases with exposure time and increasing probe current I P , as demonstrated by in-situ measurement of the temperature during e-beam irradiation. 34 Upon irradiation at 24 uA during 60 s, T S increased from initially 70°C to approximately 100°C. In the present conditions using an EPMA e-beam current of 5 µA for a maximum of 60 s irradiation, a temperature increase of approximately 6°C can be estimated assuming a linear dependence of T S with I P .…”

Section: Theoretical Aspects Of E-beam-induced Physiochemicalmentioning

confidence: 99%

“…34 Using a wide range of beam currents from 10 nA to 24 µA, we found a rapid electron-stimulated oxygen desorption even at low currents, leading to well-defined cavities in the thin films. At larger probe currents, local crystallization to anatase structure was observed.…”

Section: Introductionmentioning

confidence: 96%

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Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films

et al. 2006

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Electrolytically deposited amorphous TiO2 films on steel are remarkably sensitive to electron beam (e-beam) irradiation at moderate energies at 20 keV, resulting in controlled local oxide reduction and crystallization, opening the possibility for local topographical, chemical, and structural modifications within a biocompatible, amorphous, and semiconducting matrix. The sensitivity is shown to vary significantly with the annealing temperature of as-deposited films. Well-defined irradiation conditions in terms of probe current IP (5 microA) and beam size were achieved with an electron probe microanalyzer. As shown by atomic force and optical microscopy, micro-Raman spectroscopy, wavelength-dispersive X-ray (WDX), and Auger analyses, e-beam exposure below 1 Acm-2 immediately leads to electron-stimulated oxygen desorption, resulting in a well-defined volume loss primarily limited to the irradiated zone under the electron probe and in a blue color shift in this zone because of the presence of Ti2O3. Irradiation at 5 Acm(-2) (IP = 5 microA) results in local crystallization into anatase phase within 1 s of exposure and in reduction to TiO after an extended exposure of 60 s. Further reduction to the metallic state could be observed after 60 s of exposure at approximately 160 Acm(-2). The local reduction could be qualitatively sensed with WDX analysis and Auger line scans. An estimation of the film temperature in the beam center indicates that crystallization occurs at less than 150 degrees C, well below the atmospheric crystallization temperature of the present films. The high e-beam sensitivity in combination with the well-defined volume loss from oxygen desorption allows for precise electron lithographic topographical patterning of the present oxides. Irradiation effects leading to the observed reduction and crystallization phenomena under moderate electron energies are discussed.

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Section: Localized Reduction and Crystallizationmentioning

confidence: 48%

Section: Localized Reduction and Crystallizationmentioning

confidence: 95%

Section: Theoretical Aspects Of E-beam-induced Physiochemicalmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 96%

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Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films

et al. 2006

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“…Different PbTe and PbTe‐Au nanocrystal morphologies were produced depending on the synthesis conditions, whose the details are reported elsewhere (Franchini et al, 2010).…”

Section: Methodsmentioning

confidence: 99%

Electron microscopy studies of electron‐beam sensitive PbTe‐based nanostructures

Falqui

Bertoni

Genovese

et al. 2010

Microscopy Res & Technique

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PbTe nanocrystals were synthesized and then reacted with a toluene solution containing AuCl(3). Depending on the reaction conditions and on the starting PbTe nanocrystals morphology, different kinds of nanostructures have been obtained: single defect-free PbTe nanocrystals with and without an external amorphous oxide shell, crystalline-Au core/amorphous Pb(x)Te(y)Au(z) shell structure, large balloon-shaped (or mushroom-shaped) Au domain attached via its apex to the surface of the nanocrystals. Structure and composition of these different types of nanostructure have been studied by means of C(s)-corrected High Resolution Transmission Electron Microscopy (HRTEM) and Scanning Transmission Electron Microscopy (STEM) together with Energy Dispersive X-Ray Spectrometry (EDX), respectively. These nanostructures have been found sensitive to the high-intensity electron beam and its effect has been investigated.

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Surface Decoration for Improving the Accuracy of Displacement Measurements by Digital Image Correlation in SEM

2011

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Local electron beam induced reduction and crystallization of amorphous titania films

Abstract: Structural and electronic characterization of 355 nm laser-crystallized silicon: Interplay of film thickness and laser fluence

Cited by 31 publications

References 28 publications

Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films

Electron-Beam-Induced Topographical, Chemical, and Structural Patterning of Amorphous Titanium Oxide Films

Electron microscopy studies of electron‐beam sensitive PbTe‐based nanostructures

Surface Decoration for Improving the Accuracy of Displacement Measurements by Digital Image Correlation in SEM

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